Method for improving copper wire notches in surface of circuit board
A technology for circuit boards and copper wires, which is applied to the removal of conductive materials by mechanical methods, removal of conductive materials by chemical/electrolytic methods, and printed circuits, etc. There are gaps and other problems to achieve the effect of improving the unevenness of copper thickness, improving the quality, and improving the tightness
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Embodiment 1
[0024] A method for improving copper wire gaps on the surface of circuit boards, including the steps of cutting, pressing, copper plating, grinding, chemical micro-etching, pattern transfer, etching, and film removal; wherein:
[0025] Cutting, lamination, copper plating, graphics transfer, etching, film stripping processes are produced according to the conventional process;
[0026] Among them, the COV value of the copper thickness uniformity on the surface of the circuit board after copper plating is 7.8%, and the copper thickness is extremely poor at 14 μm.
[0027] In the grinding process, the grinding conditions used are: 1 pair of 800-mesh ceramic grinding brushes, 1 pair of 320-mesh high-cutting non-woven fabric grinding brushes, 2 pairs of 600-mesh non-woven fabric grinding brushes, the grinding current is 1.0A, and the grinding plate speed is 2.0m / min, the surface of the circuit board is polished, the COV value of the surface copper thickness uniformity after grindin...
Embodiment 2
[0033] A method for improving copper wire gaps on the surface of circuit boards, including the steps of cutting, pressing, copper plating, grinding, chemical micro-etching, pattern transfer, etching, and film removal; wherein:
[0034] Cutting, lamination, copper plating, pattern transfer, etching, and defilming processes are produced according to conventional processes.
[0035] Among them, the COV value of the copper thickness uniformity on the surface of the circuit board after copper plating is 6.9%, and the copper thickness is extremely poor at 12 μm.
[0036] In the grinding process, the grinding conditions used are: 1 pair of 600-mesh ceramic grinding brushes, 1 pair of 320-mesh high-cut non-woven grinding brushes, 2 pairs of 800-mesh non-woven grinding brushes, the grinding current is 1.5A, and the grinding speed is 2.0m / min, the surface of the circuit board is polished, the COV value of the surface copper thickness uniformity after grinding the board is 4.3%, the cop...
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