A kind of long material alkaline earth aluminosilicate glass for display

A kind of technology of aluminosilicate glass and display, which is applied in the field of glass substrate for display and long-material alkaline earth aluminosilicate glass for display, which can solve the problems of short glass frit and achieve high strain point and low thermal shrinkage rate , the effect of high mechanical strength

Active Publication Date: 2022-05-24
BENGBU CHINA OPTOELECTRONIC TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] The purpose of the present invention is to solve the problem of short glass frit existing in the existing display glass, and provide a long-form alkaline earth aluminosilicate glass for display; the present invention changes the rheological properties and Thermal properties to meet the material requirements of the molding process

Method used

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  • A kind of long material alkaline earth aluminosilicate glass for display
  • A kind of long material alkaline earth aluminosilicate glass for display
  • A kind of long material alkaline earth aluminosilicate glass for display

Examples

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Embodiment 1

[0043] A kind of alkaline earth aluminosilicate glass, concrete implementation steps are as follows:

[0044] (1) Weigh the batching materials according to the ratio in Table 1 and Table 2, and mix them well;

[0045] (2) The mixed glass batch is melted at 1450-1650°C for 7-12h, then clarified at 1650°C for 60-120min;

[0046] (3) Forming and annealing at 600-750°C for 5-10h;

[0047] (4) Processing and performance testing.

[0048] The invention provides an alkaline earth aluminosilicate glass. The glass composition has long material properties; under heat treatment at 600°C for 10 minutes, the thermal shrinkage rate is lower than 10.45ppm, the W value is lower than 1.81, and the thermal expansion coefficient is between 32-39.5 x10 -7 / °C, the Young's modulus is higher than 74GPa, the strain point temperature is higher than 693°C, and the dielectric constant is between 3.85-4.9.

[0049] In the following examples and comparative examples:

[0050] According to ASTM E-228...

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Abstract

The invention relates to a long-material alkaline earth aluminosilicate glass for displays, which is characterized in that it is made of the following raw materials by weight: 58-67% SiO 2 , 14‑19% Al 2 O 3 , 0.15‑2%B 2 O 3 , 3.15‑5%MgO, 7‑9%CaO, 0.75‑2.5%SrO, 2.75‑5%BaO, 0.1‑1%ZrO 2 , 0.15‑0.3% SnO 2 . The advantages of the invention are: suitable for large-scale industrial production, suitable for overflow method, float method, etc., and more suitable for manufacturing 8.5-generation and above high-generation glass substrates; the glass has good surface flatness, high mechanical strength, low thermal shrinkage, Excellent properties such as high strain point and long material properties; the glass raw material is an environment-friendly glass system, which does not deform during high-temperature manufacturing processes. The prepared glass is suitable for optoelectronic display, photo, photovoltaic and other industries, especially for the preparation of flat panel display products. The substrate glass substrate material and / or the substrate glass substrate material of flexible display products.

Description

technical field [0001] The invention belongs to the technical field of glass production, and relates to a glass substrate for a display, in particular to a long-material alkaline earth aluminosilicate glass for a display. Background technique [0002] Glass substrates for displays require glass substrates to have the following properties: [0003] (1) It does not substantially contain an alkali metal oxide, but if it contains an alkali metal oxide, alkali metal ions will diffuse in the semiconductor material in which the film is formed, resulting in deterioration of film characteristics. [0004] (2) Sufficient chemical durability to various chemicals used in semiconductor formation is required: [0005] a. Requirements for SiO x and SiN x Buffered hydrofluoric acid used for etching; [0006] b. Various acids (hydrochloric acid, nitric acid, sulfuric acid, etc.) used in the etching of ITO and metal electrodes; [0007] c. Durability to alkaline resist film stripper. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C3/087C03C1/00
CPCC03C3/087C03C1/004
Inventor 彭寿张冲江龙跃王平金良茂沈玉国
Owner BENGBU CHINA OPTOELECTRONIC TECH CO LTD
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