Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for promoting germination of cassia seeds in high and steep slope protection substrate

A cassia seed and base material technology, which is applied in the direction of seed immunity, planting substrate, seed and rhizome treatment, etc., can solve the problems of low germination rate, difficult survival, cassia seed not suitable for cultivation, etc., and achieve strong fertilizer retention, less pests and diseases, and root system good soil effect

Inactive Publication Date: 2021-07-09
CHINA THREE GORGES UNIV
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, on concrete slopes with high alkalinity, cassia seeds are not suitable for cultivation, and the germination rate is generally low. complex vegetation succession

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for promoting germination of cassia seeds in high and steep slope protection substrate
  • Method for promoting germination of cassia seeds in high and steep slope protection substrate
  • Method for promoting germination of cassia seeds in high and steep slope protection substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0040] Embodiments of the present invention will be described in detail below in conjunction with examples, but those skilled in the art will understand that the following examples are only used to illustrate the present invention, and should not be considered as limiting the scope of the present invention.

[0041] The invention discloses a method for promoting the germination of cassia seeds in the substrate of high and steep slope protection. The typical cross-sectional view of the high and steep slope protection structure is as follows figure 1 As shown, the schematic diagram of the construction process is shown in figure 2 shown, including the following steps:

[0042] 1) Pretreatment of cassia seeds, combining chemical and biological measures to break the dormancy of cassia seeds, specifically, first soak cassia seeds with potassium permanganate with a concentration of 1%-2.5% for 15-25min, then soak them with sterile water for 3- 8 times, then put in warm water at 60-...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for promoting germination of cassia seeds in a high and steep slope protection substrate. The method comprises the following steps: breaking dormancy of the cassia seeds by combining chemical and biological measures, preparing a slope, hanging a net, preparing a base layer and a surface layer of the high and steep slope protection substrate, spray-seeding and maintaining. The method can break the dormancy mechanism of hard cassia seeds, significantly improve the germination rate of cassia seeds, overcome the problem that herbaceous plants and shrub plants cannot be conducted at the same time and cannot cooperatively grow in the current vegetation slope protection technology, and provide an adaptive environment for the germination and growth of shrub seeds in the vegetation slope protection engineering. The shrub cassia seeds have high survival rate. The construction technology is convenient and fast, the cost is reduced, meanwhile, the restoration purpose of three-dimensional greening organically combining grass and wood is achieved, and the method has important significance on ecological succession and species diversity research of slope ecological protection engineering.

Description

technical field [0001] The invention belongs to the technical field of slope protection and ecological restoration engineering, and specifically relates to a method for promoting the germination of cassia seeds in high and steep slope protection substrates in slope ecological protection engineering, without affecting the slope protection of high and steep slopes with herbal plants Improve the erosion resistance, stability, diversity and succession of vegetation communities under certain conditions. Background technique [0002] With the vigorous development of national infrastructure construction, during the implementation of roads, railways, water conservancy, electric power, mining and other projects under the intervention of manpower or machinery, engineering activities have changed the surface structure on a large scale and destroyed the spatial continuity of the ecosystem. The ecological system has been strongly disturbed, the vegetation has been destroyed in a large am...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A01C1/00A01G22/40A01G22/00A01G24/10A01G24/20A01C1/08E02D17/20
CPCA01C1/00A01C1/08A01G22/00A01G22/40A01G24/10A01G24/20E02D17/20
Inventor 夏振尧高峰肖海郭萍许文年刘文景张千恒高超
Owner CHINA THREE GORGES UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com