Negative oxygen ion mask processing technology

A technology of negative oxygen ions and processing technology, which is applied in transportation and packaging, mixers with rotating stirring devices, plant fibers, etc., can solve the problems of insufficient uniformity and perfection of the process flow, limit the output of masks, and complicate the preparation process, etc., to achieve enhanced Antibacterial and sterilizing, releasing negative oxygen ions, maintaining persistence, and reducing processing difficulty

Pending Publication Date: 2021-07-09
重庆中膜科技集团有限公司
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The invention provides a negative oxygen ion mask processing technology, which solves the problem that the existing negative oxygen ion mask preparation process is relatively complicated, the required pre

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Negative oxygen ion mask processing technology
  • Negative oxygen ion mask processing technology
  • Negative oxygen ion mask processing technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0035] Please refer to figure 1 , figure 2 with image 3 ,in, figure 1 A schematic diagram of the internal structure of the mixer in the negative oxygen ion mask processing technology provided by the present invention; figure 2 for figure 1 The enlarged schematic diagram of part A shown image 3 It is a schematic diagram of the external structure of the mixer in the negative oxygen ion mask processing technology provided by the present invention. Negative oxygen ion mask processing technology, including the following steps:

[0036] S1. Preparation of negative oxygen ion puree: a. Select the following materials according to weight percentage, 30-35 parts of high-purity tourmaline, 20-30 parts of conductive titanium dioxide, 15-20 parts of nano-zinc oxide powder, 8-12 parts of volcanic stone 8-10 parts of nano airgel powder, 3-5 parts of rare e...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a negative oxygen ion mask processing technology. The negative oxygen ion mask processing technology comprises the steps of S1, preparing negative oxygen ion raw stock, specifically, a, respectively selecting the following materials in percentage by weight: 30-35 parts of high-purity tourmaline, 20-30 parts of conductive titanium dioxide and 15-20 parts of nano zinc oxide powder. The invention negative oxygen ion mask processing technology provided by the invention mainly comprises six steps, namely, negative oxygen ion raw stock preparation, fabric preparation, negative oxygen ion implantation and the like, an existing processing technology is integrated and simplified, the superior quality of a mask is guaranteed, the processing difficulty is greatly reduced at the same time, the processing technology can adapt to manufacturers of different scales, and then the yield of masks is improved. Meanwhile, the preparation of the negative oxygen ion raw stock is improved, and raw materials such as nano zinc oxide, nano aerogel powder, potassium octatitanate and selenium dioxide are added, so that the antibacterial, sterilizing and negative oxygen ion releasing functions of the negative oxygen ion powder are effectively enhanced, and a safe protection effect is better provided for people.

Description

technical field [0001] The invention relates to the field of mask preparation, in particular to a negative oxygen ion mask processing technology. Background technique [0002] A mask is a kind of sanitary product, which generally refers to wearing on the mouth and nose to filter the air entering the mouth and nose, so as to block harmful gases, odors, droplets, viruses and other substances. It is made of gauze or paper and other materials. The mask has a certain filtering effect on the air entering the lungs. When respiratory infectious diseases are prevalent, wearing a mask has a very good effect when working in a polluted environment such as dust. Masks can be divided into air filter masks and air supply masks. Face mask. [0003] At present, masks have become a necessity for people's daily travel, which makes the demand for masks more and more large. However, in the prior art, although the conventional masks used by people have a certain protective effect, they cannot co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A41D13/11A41D31/02A41D31/04D06M11/80D06M11/46D06M11/44D06M11/45D06M11/52B01F7/08B01F15/02D06M101/06
CPCA41D13/11A41D31/02A41D31/04D06M11/80D06M11/46D06M11/44D06M11/45D06M11/52D06M2101/06B01F27/72B01F35/75485
Inventor 周贤敏邓忠文
Owner 重庆中膜科技集团有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap