Metal conductive film, manufacturing method, touch panel and electronic product

Abstract

The invention provides a metal grid conductive film which comprises at least two metal grid layers which are consistent in wiring form and located in the same plane, the splicing positions of the metal grid layers are arranged in an overlapped mode to form a continuous trend, and a splitting part used for splicing is formed on the base portion of each metal grid layer along the extension of the original wiring. The splitting part is arranged in an overlapped mode to form an abutted seam used for achieving continuous conduction between the metal grid layers to be spliced, and the abutted seam comprises an irregular area which is formed by the splitting part and the base portion in an overlapped mode and is different from an original metal grid layer pattern. The invention further discloses a manufacturing method of the metal grid conductive film, a touch panel and an electronic product. When the large-size metal conductive film is prepared, a plurality of metal grid layers can be used for splicing, and particularly, the split parts of the metal grid layers to be spliced are overlapped together to form a continuously-conducted splicing seam, so that a continuously-conducted whole is formed between the grid layers, and the splicing quality is ensured.

Description

technical field [0001] The invention relates to the technical field of metal conductive films, in particular to a metal conductive film, a manufacturing method, a touch panel and electronic products. Background technique [0002] Transparent conductive film is a thin film with high transparency and conductive properties in the visible light range. It is mainly used in optoelectronic devices such as transparent electrodes of liquid crystal displays, touch screens, and transparent electrodes of thin-film solar cells. At present, the technology of using metal grid to make transparent conductive film with a size below 600mm*600mm is very mature, but limited by the existing equipment conditions, it is impossible to prepare an integrated metal grid transparent conductive film with a size above 600mm*600mm , that is, for large-sized transparent conductive films, existing machines cannot directly form one piece, which is not conducive to the production of large-sized conductive film...

AI Technical Summary

Problems solved by technology

At present, the technology of using metal grid to make transparent conductive film with a size below 600mm*600mm is very mature, but limited by the existing equipment conditions, it is impossible to prepare an integrated metal grid transparent conductive film with a size above 600mm*600mm , that is, for large-sized transparent conductive films, existing machines cannot directly form one piece, which is not conducive to the production of large-sized conductive films

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