Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sliding base-isolation device

A shock isolation, sliding surface technology, applied in shockproof, clothing, spring/shock absorber, etc., can solve the problems of reduced use frequency, heavier weight, lower cost competitiveness, etc., to achieve the effect of excellent sliding durability

Inactive Publication Date: 2022-02-15
NIPPON STEEL & SUMIKIN ENG CO LTD +1
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, in the conventional sliding vibration isolation device, the reference (standard) surface pressure of Teflon (Teflon; registered trademark) etc. installed in the device is 20N / mm 2 (20MPa), so when the weight of the load (load) increases due to the increase in height of the structure, in order to obtain a sliding isolator with a planar size that can match the load, the sliding isolator has to be enlarged. Scale (Large)
For this reason, compared with other different types of vibration isolators such as laminated rubber vibration isolators, the cost competitiveness becomes lower, resulting in a decrease in the frequency of use

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sliding base-isolation device
  • Sliding base-isolation device
  • Sliding base-isolation device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] Next, the sliding vibration isolation device according to each embodiment will be described with reference to the drawings. In addition, in this specification and drawing, the same code|symbol is attached|subjected to the substantially same structural element, and the overlapping description may be omitted.

[0044] [Sliding vibration isolation device of the first embodiment]

[0045] First, refer to Figure 1 to Figure 4 An example of the sliding vibration isolation device according to the embodiment will be described. here, figure 1 It is an exploded perspective view of the sliding vibration isolation device of the first embodiment, figure 2 It is a longitudinal sectional view of the sliding vibration isolation device of the first embodiment. also, image 3 is a plan view of a friction material composed of a single layer of fabric viewed from above, Figure 4 is along image 3 The cross-sectional view cut along the line IV-IV in , is a diagram illustrating the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

Provided is a sliding base-isolation device that has excellent sliding durability without thickening the thickness of a friction material. A sliding base-isolation device 100 comprising: structure fixing plates 20, 30 having first sliding surfaces 21, 31; and a metal sliding body 10 having second sliding surfaces 12, 13 that abut the first sliding surfaces 21, 31, wherein a friction material 40 that is made from a single-layer woven product formed by a plurality of twisted yarns 41 obtained by twisting high-strength fibers and PTFE fibers together, is attached to the first sliding surfaces 21, 31 and / or the second sliding surfaces 12, 13.

Description

technical field [0001] The present disclosure relates to a sliding seismic isolation device. Background technique [0002] In earthquake-prone countries, for various structures such as buildings, bridges, elevated roads, and detached houses, various anti-seismic technologies such as anti-seismic technologies and technologies for reducing the seismic force entering structures have been developed. Earthquake technology and earthquake control technology have been applied to various structures. Among them, the seismic isolation technology is a technology that reduces the seismic force itself entering the structure, so it can effectively reduce the vibration of the structure during an earthquake. The outline of this seismic isolation technology is to install a seismic isolation device between the substructure, that is, the foundation, and the superstructure to reduce the transmission of the vibration of the foundation caused by the earthquake to the superstructure, thereby reduc...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): E01D19/04E04H9/02E04B1/98
CPCE01D19/042E04H9/021E04B1/98D03D15/283D03D11/00D03D15/58D10B2321/042D03D13/004B32B7/12B32B15/18B32B5/024B32B2255/26B32B2307/744B32B2307/5825B32B2307/54B32B15/14B32B2255/06B32B2262/02B32B2262/0276B32B2571/00B32B2262/16B32B2262/0253B32B15/043F16F2222/04B32B2262/0238D03D13/00D10B2331/04D10B2331/14D10B2331/301D10B2505/00F16F7/08
Inventor 山崎伸介野吕直以小西克尚渡边厚西本晃治关山雅人二宫有希原田大
Owner NIPPON STEEL & SUMIKIN ENG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com