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Load lock device

A technology of load locking and loading chamber, which is applied in the direction of vacuum evaporation plating, coating, gaseous chemical plating, etc., and can solve the problems of reducing pump exhaust efficiency and poor manufacturing

Pending Publication Date: 2022-03-01
CANON ANELVA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Such particles can cause defective manufacture of items manufactured using the substrate
If the gap between the side surface of the substrate table and the inner surface of the vacuum container is reduced to suppress particles from flying to the space above the substrate, the exhaust efficiency of the pump may decrease.

Method used

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Embodiment Construction

[0016] Embodiments will be described in detail below with reference to the drawings. In addition, the following embodiment does not limit the invention which concerns on a claim. Although several features were described in embodiment, not all of these many features are essential components of invention, and some features can also be combined arbitrarily. In addition, in the drawings, the same reference numerals are assigned to the same or similar configurations, and overlapping descriptions will be omitted.

[0017] figure 1 The configuration of a processing device including a load lock device 100 according to an embodiment of the present invention is schematically shown. The load lock device 100 can include a load lock chamber 110 disposed between the loading chamber 30 and the transfer chamber 20 . The loading chamber 30 can be maintained in an atmospheric environment. In the load chamber 30 , for example, the substrate S can be supplied from a carrier. Alternatively, t...

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PUM

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Abstract

A load lock device is provided with: a load lock chamber having a first transport port connected to a transfer chamber connected to a pressure reduction processing device and a second transport port connected to a loading chamber; a substrate holder that holds a substrate in the load lock chamber; a drive mechanism that is disposed below the load lock chamber so as to raise and lower the substrate holder, and that is connected to the substrate holder via a connection member; an extension chamber that extends laterally from the lower part of the load lock chamber; and a pump that is disposed below the extension chamber and that discharges the gas in the load lock chamber through the extension chamber. The extension chamber has a bottom surface having an opening at a position offset from the vertically lower side of the substrate holder, and the pump is connected to the opening.

Description

technical field [0001] The invention relates to a load lock device. Background technique [0002] Patent Document 1 discloses a load lock device including: a vacuum container, a substrate stage that is lifted and lowered in the vacuum container, and an opening disposed below the substrate stage in the bottom surface of the vacuum container and the vacuum. A high vacuum pump connected to the container. [0003] In a structure in which a pump connected to the vacuum container through an opening arranged below the substrate stage in the bottom surface of the vacuum container is arranged, particles generated by the pump or particles sucked by the pump and bounced back by the pump fly up and reach the surface of the substrate. The space on the upper side may be attached to the substrate. Such particles can cause defective manufacture of articles manufactured using the substrate. If the gap between the side surface of the substrate stage and the inner surface of the vacuum cont...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/56C23C16/44H01J37/32
CPCH01J37/32743H01J37/32788C23C14/568C23C16/458H01L21/3065H01L21/02H01L21/67201H01L21/68742H01L21/67017H01L21/67721H01L21/68785H01L21/677H01L21/68764
Inventor 三浦顺福田直哉熊谷修二高城信二户田哲郎下川英利根岸智野村聪志添田纯也
Owner CANON ANELVA CORP