Light field matting method and device based on air angle consistency

A consistent, empty angle technology, applied in image analysis, image data processing, instruments, etc., can solve the problems of inability to maintain the consistency of light field data, large size of light field data, and difficulty in meeting downstream technologies and applications

Pending Publication Date: 2022-07-12
BEIJING INFORMATION SCI & TECH UNIV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The sub-aperture image operation method does not consider the connection between different sub-aperture images, and cannot maintain the consistency of the empty angle of the light field data, and the obtained results are difficult to meet the requirements of downstream

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Light field matting method and device based on air angle consistency
  • Light field matting method and device based on air angle consistency
  • Light field matting method and device based on air angle consistency

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0078] In the drawings, the same or similar reference numerals are used to denote the same or similar elements or elements having the same or similar functions. The embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0079] like figure 1 As shown, the method for light field matting based on void angle consistency provided by the embodiment of the present invention includes:

[0080] Step 1, extract the central sub-aperture image of the light field data and calculate its disparity.

[0081] Step 2, calculate the alpha map of the central sub-aperture image.

[0082] Step 3: Propagating the alpha map of the central sub-aperture image through the light field alpha map propagation model provided by formula (1) to obtain the light field alpha map alpha u,v (x,y);

[0083]

[0084] In the formula, is the center point of view (u 0 ,v 0 ), the alpha map of the sub-aperture image, disp(x, y) is the disparity co...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a light field matting method and device based on air angle consistency. The method comprises the following steps: step 1, extracting a central sub-aperture image of light field data and calculating the parallax of the central sub-aperture image; step 2, calculating a central sub-aperture image alpha graph; and step 3, propagating the central sub-aperture image alpha image through a light field alpha image propagation model to obtain a light field alpha image alpha u, v (x, y). By adopting the method provided by the invention, accurate and consistent light field matting can be realized, and the air angle consistency of the light field matting can be evaluated.

Description

technical field [0001] The present invention relates to the technical field of optical information processing, in particular to a method and device for optical field matting based on void angle consistency. Background technique [0002] Light field describes the distribution of light in free space. Light field data captures the radiation of light from all directions, and records the spatial information, angle information and intensity information of light. Light field imaging can capture richer visual information, making up for traditional photography. The angle information that is lost in the simulation provides stronger capabilities for scene understanding and improves the performance of traditional computer vision problems. [0003] A 4D light field data can be represented by a 2D sub-aperture image array, so the 2D image matting algorithm by sub-aperture image can be regarded as realizing the matting of 4D light field data to a certain extent. The subaperture-by-subaper...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G06T7/11G06T7/194G06T7/50
CPCG06T7/11G06T7/194G06T7/50G06T2207/10052
Inventor 何迪刘畅刘天艺邱钧
Owner BEIJING INFORMATION SCI & TECH UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap