Electrooptic device, projection type display and method for manufacturing electrooptic device
An electro-optical device and light valve technology, applied in optics, nonlinear optics, circuits, etc., can solve problems such as difficulty in improving display images, difficulty in shading, increase in internal surface reflection or multiple reflections, etc.
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no. 1 Embodiment
[0102] First, refer to Figure 1 to Figure 16 The electro-optical device of the first embodiment will be described.
[0103] refer to Figure 1 to Figure 9 The configuration and operation of the electro-optical device using the present invention will be described. figure 1 It is an equivalent circuit diagram of various elements, wiring, etc. formed on a plurality of pixels arranged in a matrix in the electro-optical device according to the first embodiment of the present invention. figure 2 yes figure 1 It is a plan view of multiple adjacent pixel groups of the TFT array substrate on which data lines, scanning lines, pixel electrodes and light-shielding films have been formed in the electro-optic device shown. image 3 is an enlarged view showing a pixel electrode formation region of the TFT array substrate. Figure 4 is an enlarged view showing the scan line and data line forming regions of the TFT array substrate. Figure 5 It is an enlarged view showing the formation ...
no. 2 Embodiment
[0173] Second, refer to Figure 17 An electro-optical device according to a second embodiment of the present invention will be described. Figure 17 It is a cross-sectional view of the electro-optical device 100' of the second embodiment.
[0174] In the manufacturing method of the electro-optical device 100 of the above-mentioned first embodiment, reference to Figure 11 (B) illustrates the formation process of the connection groove 161, while referring to Figure 13 (D) In the step of forming the side wall forming groove 16 described, as Figure 17 As shown, the side wall forming groove 16 is formed so as to reach the second light-shielding film 14, whereby the electro-optical device 100' of the second embodiment is manufactured. The other manufacturing steps are the same as those of the first embodiment.
[0175] Such as Figure 17 As shown, if it is manufactured in this way, when forming the first light-shielding film 13, use the light-shielding sidewall 131 formed ...
no. 3 Embodiment
[0177] Second, refer to figure 1 and Figure 18 to Figure 20 The pixel portion of the electro-optical device according to the third embodiment of the present invention will be described. Figure 18 It is a plan view of a plurality of adjacent pixel groups of the TFT array substrate on which data lines, scanning lines, pixel electrodes, etc. have been formed in the third embodiment. Figure 19 yes Figure 18 The D-D' section diagram, Figure 20 It is related to the part of the laminate formed on the TFT array substrate 10 Figure 18 The E-E' cross-section diagram. again, in Figure 19 and Figure 20 In , the size of each layer and each component is drawn in a recognizable size on the figure, so the scale of each layer and each component is different. Furthermore, in the third embodiment from Figure 18 to Figure 20 in, right and from Figure 1 to Figure 9 Components that are the same as those in the first embodiment shown are given the same reference numerals, and desc...
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Abstract
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