Hyperpure water manufacturing systems

A manufacturing system and ultra-pure water technology, applied in water/sewage treatment, non-polluted water treatment, light water/sewage treatment, etc., can solve problems such as products without structure

Inactive Publication Date: 2007-08-08
KURITA WATER INDUSTRIES LTD
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to solve the problems existing in the ultrapure water manufacturing system, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and there is no suitable structure for general products to solve the above problems. This is obviously a problem that relevant industry players are eager to solve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hyperpure water manufacturing systems
  • Hyperpure water manufacturing systems
  • Hyperpure water manufacturing systems

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0079] The specific implementation, structure, features and functions of the ultrapure water production system proposed according to the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments.

[0080] Please refer to FIG. 1 , which is a system diagram of an embodiment of the ultrapure water production system of the present invention. The primary pure water is supplied to the secondary storage tank 2 from the pipe 1 and stored. The water in the secondary storage tank 2 is sent out by the pump 3 . Pump 4 is a backup pump and is arranged in parallel with pump 3 . A dedicated sterilization pump 5 is arranged in parallel with the pumps 3 and 4 .

[0081] In addition, a drain line 6e used when draining water from the sub tank 2 is branched from the discharge ports of the pumps 3 and 4 .

[0082] The water sent out by the pump 3 or 4 through the pipe 8 sequentially passes through the heat exchange device 10 cons...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
electrical resistivityaaaaaaaaaa
Login to view more

Abstract

The ultrapure water producing system produces ultrapure water with high purity and remarkably low content of metals even just after restart of operation thereof. Water sent through the pump 3 or 4 into a line 8 flows through a heat exchanger 10 , a line 12 , a UV oxidation apparatus 20 , a line 22 , an ion exchange device 30 , a line 32 and a membrane filtering device 40 and is treated in each device in this order to be ultrapure water. The devices 10, 20, 30, 40 have bypass lines 11, 21, 31, 41 , respectively. In the sterilizing process, bactericide water is fed only to the membrane filtering device 40 via the bypass lines 11, 21 and 31 . In the following sterilizing process of the heat exchanger 10 and the UV oxidation apparatus 20 , the bactericide water flows the line 41 bypassing around the membrane filtering device 40.

Description

technical field [0001] The invention relates to an ultrapure water production system, in particular to an ultrapure water production system for sending the ultrapure water produced by the main body of an ultrapure water maker to a point of use. Background technique [0002] Ultrapure water is used as cleaning water in cleaning processes in fields such as semiconductor manufacturing. As ultrapure water, it is required not to contain particles, organic substances, and inorganic substances that cause cleaning failures, such as resistivity: 18.2MΩ·cm or more, particles: 1 / mL or less, live bacteria: 1 / L or less, TOC (Total Organic Carbon, total organic carbon): below 1μg / L, silicon oxide: below 1μg / L, metals: below 1ng / L, ions: below 10ng / L, the required water quality can be achieved. [0003] The use place (point of use) of ultrapure water is connected to the ultrapure water manufacturing device by using piping (flow path), and the remaining ultrapure water that is not used at ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C02F9/00C02F1/00C02F1/32C02F1/42C02F1/44C02F1/50C02F1/72B01D65/02F16B2/06
CPCC02F2301/043C02F9/00Y10S210/90A61L2/186C02F1/32C02F1/42C02F2103/04C02F1/441C02F1/444C02F1/722C02F1/44
Inventor 古川征弘奥村正刚
Owner KURITA WATER INDUSTRIES LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap