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Polishing kit for magnetic disk

一种研磨液、磁盘用的技术，应用在含研磨剂的抛光组合物、研磨装置、研磨机床等方向，能够解决成本、生产率下降等问题

Inactive Publication Date: 2012-02-01
KAO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, there is a problem that more cost is required, productivity decreases, etc.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～3、 comparative example 1～4

[0115] [Preparation of Polishing Liquid Composition]

[0116] In 2 liters of polyethylene resin containers, add following each material according to following compounding ratio, make total weight be 1.5 kilograms, make polishing liquid composition by stirring and mixing: 12.75 weight % of α-alumina (primary particle The average particle size is 0.07 microns, the average particle size of the secondary particles is 0.3 microns, and the specific surface area is 15m 2 / g, purity is 99.9%), 0.8% by weight of sulfuric acid, 4.28% by weight of citric acid, 7.31% by weight of 35% hydrogen peroxide water (2.56% by weight in terms of hydrogen peroxide), and the remainder is ion-exchanged water. In addition, the polishing liquid composition and ion-exchanged water were added to a 4-liter polyethylene resin container at a mixing ratio (weight ratio) of 1:4 so that the total weight was 4 kg, and stirred and mixed to obtain a reference example. 1 abrasive composition.

[0117] (A) compone...

Embodiment 4、5 and comparative example 5～7

[0142] A polishing liquid composition was prepared in the same manner as in Example 1 except that the polishing liquid kits of Examples 4 and 5 and Comparative Examples 5 to 7 having the configuration shown in Table 2 were used. Polishing evaluations were performed on these polishing liquid compositions. Taking the polishing rate of the polishing liquid composition of Reference Example 2 as the reference value 1, the relative values ​​of the polishing rates of the polishing liquid compositions of the respective examples and comparative examples were obtained. The results are shown in Table 2. In addition, the polishing liquid composition of Reference Example 2 was prepared in the same manner as the polishing liquid composition of Reference Example 1 except that it had the composition shown in Table 2.

[0143] Table 2

[0144] The composition of the polishing solution kit

Mixing ratio (weight ratio)

i / ii / iii / ion-exchanged water

pH

...

Embodiment 6 and comparative example 8～11

[0148] A polishing liquid composition was produced in the same manner as in Example 1 except that the polishing liquid kits of Example 6 and Comparative Examples 8 to 11 having the configuration shown in Table 3 were used. Polishing evaluations were performed on these polishing liquid compositions. Taking the polishing rate of the polishing liquid composition of Reference Example 3 as the reference value 1, the relative values ​​of the polishing rates of the polishing liquid compositions of the respective examples and comparative examples were obtained. The results are shown in Table 3. In addition, the polishing liquid composition of Reference Example 3 was prepared in the same manner as the polishing liquid composition of Reference Example 1 except that it had the composition shown in Table 3.

[0149] table 3

[0150] The composition of the polishing solution kit

Mixing ratio (weight ratio)

i / ii / iii / ion exchange

pH

R...

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Abstract

A polishing kit for a magnetic disk containing (A) a slurry containing an alumina, (B) an oxidizing agent solution containing an oxidizing agent, and (C) an acid agent solution containing an acid; a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (D) an additive solution containing an oxidizing agent and an inorganic acid; and a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (C) an acid agent solution containing an acid, wherein the polishing kit is used with an oxidizing agent solution (B) containing an oxidizing agent; and a polishing process for a magnetic disk substrate, including the steps of feeding a liquid mixture containing components of a specified polishing kit to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture. The polishing composition kit can be suitably used for the manufacture of high-quality magnetic disk substrates such as hard disks.

Description

technical field [0001] The present invention relates to a polishing kit for a magnetic disk, a method for polishing a magnetic disk substrate, and a method for manufacturing the magnetic disk substrate. Background technique [0002] In order to reduce the minimum recording area of ​​a hard disk drive and promote high capacity, it is required to reduce the floating amount of the magnetic head and to have substantially no surface defects (surface smudges). In order to reduce the floating amount of the magnetic head, a polishing liquid composition containing alumina, an oxidizing agent, and an acid has been studied (see Japanese Patent Application Laid-Open No. 2003-147337 and Japanese Patent Laid-Open No. 11-246849). [0003] However, these polishing liquid compositions may not be able to sufficiently express the polishing rate during storage after preparation, and thus lack reproducibility. Therefore, for example, when the grinding speed is reduced, in order to have a suffic...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B24B37/00C09K3/14B24B57/02G11B5/73B24B1/00C09G1/02G11B5/84
CPCC09G1/02B24B37/048B24B37/00C09K3/1463
Inventor 大泽清辉北山博昭萩原敏也
Owner KAO CORP
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