Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and device for producing exposed structures

The technology of an exposure device and a control device is applied in the direction of photolithography exposure device, microlithography exposure device, optics, etc., which can solve the problem of low efficiency and achieve the effect of improving efficiency and fast exposure speed.

Inactive Publication Date: 2005-10-05
KLEO HALBLEITERTECHNIK GMBH & CO KG
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] This method is known from the prior art, where the problem is that this method is not efficient

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for producing exposed structures
  • Method and device for producing exposed structures
  • Method and device for producing exposed structures

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0095] The device according to the invention shown in FIG. 1 comprises an exposure device 10 comprising a lens 12 and an exposure control device 14 assigned to the lens.

[0096] The exposure device 10 is in this case supported on a base body 18 , for example by means of bridges 16 .

[0097] The bridge body 16 thus overlaps a movement range 20 in which the carrier slide 22 can move relative to the base body 18, wherein the carrier slide 22 slides on a guide surface 24 of the base body 18, for example via an air cushion. As described in German patent application 101 12 344.6, reference is made to this patent application in its entirety.

[0098] Furthermore, a substrate carrier 26 is arranged on the carrier slide 22 , on which, for example, two substrate bodies 28 a , b to be exposed by the exposure device 10 are fastened.

[0099]To this end, the carrier slide 22 can, for example, be guided in two directions parallel to the guide surface 24 within the movement area 20 by mea...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for producing exposed structures on a plurality of sub-assemblies using an exposure device. According to said method, substrate bodies and the exposure device are displaced in relation to one another and identical structures are produced on at least one section of the sub-assemblies. The aim of the invention is to improve said method and make it as efficient as possible. This is achieved as follows: each of the identical structures is produced within a plurality of macro lines by exposing the substrate body in the vicinity of the respective sub-assembly; each of the macro lines comprises a plurality of neighbouring lines; during a single sweep of an exposure path by the exposure device, all sub-assemblies caught in said exposure path are exposed in the vicinity of the same macro line of the plurality of macro lines; the exposure device comprises a plurality of light sources and a controller with a controller memory, from which previously stored data records of the macro line that lies in the vicinity of the exposure can be read out, whilst data records of an additional line can be stored.

Description

technical field [0001] The invention relates to a method for producing exposed structures in a plurality of components arranged on at least one substrate body by means of an exposure device, in which at least one substrate body arranged on a substrate carrier and the exposed The devices are moved relative to one another in a main direction and in a secondary direction perpendicular to the main direction, wherein identical structures are produced on at least some of the components. Background technique [0002] Such methods are known from the prior art, wherein the problem is that they are not efficient. Contents of the invention [0003] The object of the present invention is to improve the method for producing such exposure structures according to classification in such a way that the method works as efficiently as possible. [0004] This object is achieved according to the invention in a method for producing exposed structures in that each identical structure is passed ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70425G03F7/704G03F7/70525
Inventor 汉斯·奥普韦斯特凡·沙尔迪尔克·莱嫩巴赫
Owner KLEO HALBLEITERTECHNIK GMBH & CO KG