Three-D nano-porous film and its manufacturing method
A three-dimensional nano-porous film technology, applied in optics, instruments, optical components, etc., can solve problems such as low cross-linking density, poor mechanical strength and hardness of anti-reflective films, and inability to use reflective optical coatings for flat-panel displays. Achieve the effect of protecting wear and avoiding interference
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2006-11-29
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a three-dimensional nanoporous film and a manufacturing method thereof, in particular to a three-dimensional nanoporous film with high mechanical strength and anti-reflection capability and a manufacturing method thereof. Background technique
[0002] In the manufacturing process of display devices (such as: optical lenses, cathode ray displays, plasma displays, liquid crystal displays, or light-emitting diode displays), in order to prevent the image from being disturbed by glare or reflected light, the outermost layer of the display device (such as a transparent substrate of a liquid crystal display) to configure an anti-reflection layer.
[0003] Anti-reflection optical films with a single-layer structure have gradually become the main research and development trend in anti-reflection technology due to their excellent processing convenience, high yield, high output and low equipment cost. However, known fluorine-containing i...
Examples
Embodiment 1
[0099] Oxygenate colloid A with polymerizable groups
[0100] Take a reaction bottle, put 3-(methacrylic acid group) propyl trimethoxy silane (3-methacrylicoxy-propyl trimethoxy silane), tetra-methoxy silane (tetra-methoxy silane, TMOS), hydrochloric acid (HCl ), deionized water (de-ionwater) and ethanol, after uniform mixing, reflux (reflux) at 60°C for 3 hours, wherein the 3-(methacryl)propyltrimethoxysilane, tetramethoxysilane, The molar ratio of hydrochloric acid, deionized water and ethanol is 0.25 / 0.75 / 0.1 / 4 / 15. After the reaction is complete, the oxygen-containing compound colloid A having a polymerizable group can be obtained.
Embodiment 2
[0102] Oxygenate colloid B with polymerizable groups
[0103] Take a reaction bottle, put Y-glycidoxypropyl-trimethoxysilane (Y-glycidoxypropyl-trimethoxysilane), tetra-ethoxysilane (tetra-ethoxy silane, TEOS), hydrochloric acid (HCl), deionized Water (de-ionwater) and ethanol, after uniform mixing, reflux (reflux) at 35°C for 1 hour, wherein the Y-glycidyl trimethoxysilane, tetraethoxysilane, hydrochloric acid, deionized water and The molar ratio of ethanol is 0.3:0.7:0.05:4:50. After the reaction is complete, the oxygen-containing compound colloid B (siloxane colloid) having a polymerizable group can be obtained.
Embodiment 3
[0105] Oxygenate colloid C with polymerizable groups
[0106] Take a reaction bottle, put vinyltriethoxysilane (vinyltriethoxysilane), tetraethoxysilane (tetra-ethoxy silane, TEOS), hydrochloric acid (HCl), deionized water (de-ion water) and ethanol in the bottle , after uniform mixing, reflux at 60°C for 3 hours, wherein the molar ratio of vinyltriethoxysilane, tetraethoxysilane, hydrochloric acid, deionized water and ethanol is 0.5:0.5:0.1:4: 60. After the reaction is complete, the oxygenate colloid C with polymerizable groups can be obtained.