Three-D nano-porous film and its manufacturing method

A three-dimensional nano-porous film technology, applied in optics, instruments, optical components, etc., can solve problems such as low cross-linking density, poor mechanical strength and hardness of anti-reflective films, and inability to use reflective optical coatings for flat-panel displays. Achieve the effect of protecting wear and avoiding interference

Active Publication Date: 2006-11-29
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since this known antireflective film is completely composed of the condensation product of tetramethoxysilane, the mechanical strength of the film is only derived from the silicon-oxygen-silicon bond (Si-O- Si), and the crosslinking density of the con

Method used

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  • Three-D nano-porous film and its manufacturing method
  • Three-D nano-porous film and its manufacturing method
  • Three-D nano-porous film and its manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0098] Example 1

[0099] Oxygenate colloid A with polymerizable groups

[0100] Take a reaction bottle, put 3-(methacrylic acid group) propyl trimethoxy silane (3-methacrylicoxy-propyl trimethoxy silane), tetra-methoxy silane (tetra-methoxy silane, TMOS), hydrochloric acid (HCl ), deionized water (de-ionwater) and ethanol, after uniform mixing, reflux (reflux) at 60°C for 3 hours, wherein the 3-(methacryl)propyltrimethoxysilane, tetramethoxysilane, The molar ratio of hydrochloric acid, deionized water and ethanol is 0.25 / 0.75 / 0.1 / 4 / 15. After the reaction is complete, the oxygen-containing compound colloid A having a polymerizable group can be obtained.

Example Embodiment

[0101] Example 2

[0102] Oxygenate colloid B with polymerizable groups

[0103] Take a reaction bottle, put Y-glycidoxypropyl-trimethoxysilane (Y-glycidoxypropyl-trimethoxysilane), tetra-ethoxysilane (tetra-ethoxy silane, TEOS), hydrochloric acid (HCl), deionized Water (de-ionwater) and ethanol, after uniform mixing, reflux (reflux) at 35°C for 1 hour, wherein the Y-glycidyl trimethoxysilane, tetraethoxysilane, hydrochloric acid, deionized water and The molar ratio of ethanol is 0.3:0.7:0.05:4:50. After the reaction is complete, the oxygen-containing compound colloid B (siloxane colloid) having a polymerizable group can be obtained.

Example Embodiment

[0104] Example 3

[0105] Oxygenate colloid C with polymerizable groups

[0106] Take a reaction bottle, put vinyltriethoxysilane (vinyltriethoxysilane), tetraethoxysilane (tetra-ethoxy silane, TEOS), hydrochloric acid (HCl), deionized water (de-ion water) and ethanol in the bottle , after uniform mixing, reflux at 60°C for 3 hours, wherein the molar ratio of vinyltriethoxysilane, tetraethoxysilane, hydrochloric acid, deionized water and ethanol is 0.5:0.5:0.1:4: 60. After the reaction is complete, the oxygenate colloid C with polymerizable groups can be obtained.

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Abstract

The invention relates to a 3D nano-porous film and the manufacturing method thereof. And the manufacturing method comprises: (a) providing a substrate, which has a precoating surface; (b) forming a film layer composed of 3D nano porous coating combination on the precoating surface; (c) supplying energy to the film layer to making polymerization reaction on the above combination so as to form organic-inorganic mixed layer on the precoating surface; and (d) dissolving out template from the mixed layer by second solvent to form the 3D nano porous film, which has effective refractive index below 1.45 and reflectivity not greater than 3%, and extremely good mechanical strength and rigidity, completely suitable to be used as antireflective and wearable coating for a display unit.

Description

technical field [0001] The invention relates to a three-dimensional nanoporous film and a manufacturing method thereof, in particular to a three-dimensional nanoporous film with high mechanical strength and anti-reflection capability and a manufacturing method thereof. Background technique [0002] In the manufacturing process of display devices (such as: optical lenses, cathode ray displays, plasma displays, liquid crystal displays, or light-emitting diode displays), in order to prevent the image from being disturbed by glare or reflected light, the outermost layer of the display device (such as a transparent substrate of a liquid crystal display) to configure an anti-reflection layer. [0003] Anti-reflection optical films with a single-layer structure have gradually become the main research and development trend in anti-reflection technology due to their excellent processing convenience, high yield, high output and low equipment cost. However, known fluorine-containing i...

Claims

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Application Information

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IPC IPC(8): G02B1/11G02B1/118
Inventor 王武敬王彦博李云卿陈重裕施希弦陈先彬
Owner IND TECH RES INST
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