Process for modifying the surface profile of an ink supply channel in a printhead
A supply channel and surface shape technology is applied in the field of correcting the surface shape of an ink supply channel of a print head, and can solve problems such as grass-like undulations and scalloped sidewalls.
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[0118] FIG. 2 shows a prior art printhead nozzle arrangement with an angular shoulder 11 defining the connection between the ink supply channel 6 and the inlet 8 . These angular shoulders are etched very deeply by the prior art as described above and in the applicant's US patent application serial nos. methods, both of which are incorporated herein by reference.
[0119] Referring to Figure 3, there is shown the ink supply channel 6 before the photoresist plug 10 is removed. The ink supply channel 6 is partially etched beyond the photoresist plug 10 and around the photoresist plug 10 . According to the invention, during the processing of the printhead, the wafer is subjected to argon ion milling in a plasma etching reactor. Optimum operating parameters for a plasma etch reactor can be readily determined by those skilled in the art.
[0120] During the argon ion milling, the angular shoulder 11 is tapered by simultaneously etching and redepositing sputtered silicon back onto...
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