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Method and apparatus having plate electrode for surface treatment using capillary discharge plasma

a technology of capillary discharge plasma and surface treatment, which is applied in the direction of cleaning processes and apparatuses, electric discharge tubes, chemistry apparatuses and processes, etc., can solve the problems that the background art plasma process cannot be used to treat the workpiece and the application of background art plasma processes is limited

Inactive Publication Date: 2003-04-17
PLASMION
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  • Summary
  • Abstract
  • Description
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Problems solved by technology

All the background art plasma processes, however, have to be carried inside a treatment chamber because the background art plasma processes can only be performed under a vacuum condition.
Thus, when a workpiece is too big to be treated in the chamber, the background art plasma process cannot be used to treat the workpiece.
As a result, the background art plasma processes are very limited in applications.

Method used

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  • Method and apparatus having plate electrode for surface treatment using capillary discharge plasma
  • Method and apparatus having plate electrode for surface treatment using capillary discharge plasma
  • Method and apparatus having plate electrode for surface treatment using capillary discharge plasma

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Embodiment Construction

[0028] Reference will now be made in detail to the present illustrated embodiments of the invention, examples of which are illustrated in the accompanying drawings. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or like parts.

[0029] FIG. 1A is a schematic cross-sectional view of an embodiment of a capillary discharge plasma head for surface treatment for conductive workpieces. The apparatus includes at least one plate electrode 141, a dielectric body 142, at least one capillary 143 formed in the dielectric body 142 and extending substantially therethrough, and a counter-electrode 145, wherein a workpiece 144 is placed. The apparatus discharges plasma through the capillaries and onto the conductive workpiece 144. Throughout the present invention, the plate electrode 141 may consist of more than one plate. Moreover, there is no critical geometry for the plate electrode 141 as long as the plate electrode matches all of the capill...

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Abstract

A method and an apparatus for treating a workpiece using a plasma discharge are disclosed in the present invention. In treating a workpiece using a plasma discharge, the apparatus includes at least one plate electrode electrically coupled to a power source, a dielectric body having first and second sides, wherein the first side is coupled to the at least one plate electrode and the second side has at least one capillary extending substantially therethrough in a direction of the first side of the dielectric body, and a counter electrode electrically coupled to the power source.

Description

[0001] 1. Field of the Invention[0002] The present invention relates to a plasma discharge apparatus, and more particularly to a method and an apparatus having at least one plate electrode for surface treatment using capillary discharge plasma shower. Although the present invention is suitable for a wide scope of applications, it is particularly suitable for plasma treatment of workpieces under an atmospheric pressure or a higher pressure, thereby providing virtually unrestricted applications regardless of size of the workpieces.[0003] 2. Discussion of the Related Art[0004] A plasma discharge has been widely used for treating surfaces of a variety of workpieces in many different industries. Particularly, stations for cleaning or etching electronic components such as a printed circuit boards (PCB), lead frames, microelectronic devices, and wafers, have been employed in electronics industries since they provide advantages over the conventional chemical cleaning apparatus. For example,...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): H01J37/32H05K3/26
CPCH01J37/32009H05K3/26H01J37/32532
Inventor KIM, STEVENYU, DONG WOO
Owner PLASMION
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