Pump controller for precision pumping apparatus

Abstract

A pump controller and pump controlling method for dispensing a precise amount of low viscosity fluid are provided in which the problems of double dispenses and stuttered dispenses are avoided. In particular, the timing of the valves and motors in the pumping apparatus are adjusted to avoid these problems.

Description

BACKGROUND OF THE INVENTION

[0001] This invention relates generally to precision pumping apparatus and, more particularly to a pump controller for accurately controlling the amount of fluid dispensed from the precision pumping apparatus.

[0002] There are many applications where precise control over the amount and / or rate at which a fluid is dispensed by a pumping apparatus is necessary. In semiconductor processing, for example, it is important to control very precisely the amount and the rate at which photochemicals, such as photoresist, are applied to a semiconductor wafer being processed to manufacture semiconductor devices. The coatings applied to semiconductor wafers during processing typically require a flatness across the surface of the wafer that is measured in angstroms. Many semiconductor processes today have requirements on the order of 30 angstroms or less. The rate at which processing chemicals such as photoresists are applied to the wafer and spun out through centrifuga...

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