Mask apparatus

a mask and mask technology, applied in the field of masks, can solve the problem that no prior art patents teach the use of woven fabric masks, and achieve the effect of enhancing the wearer's ability to s
US20060242749A1Inactive Publication Date: 2006-11-02PENZARELLA FELIX

Patent Information

Authority / Receiving Office
US Β· United States
Patent Type
Applications(United States)
Current Assignee / Owner
PENZARELLA FELIX
Publication Date
2006-11-02
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The Invention is a mask. The mask comprises a mask body covering the head of a wearer and supported a perforated panel before the eyes of the wearer. The perforated panel features a multiplicity of small perforations cut, punched, burned or formed through the perforated panel through which the wearer may see.
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Description

BACKGROUND OF THE INVENTION

[0001] 1. Field of the Invention

[0002] The Invention relates to a mask worn by an individual to obscure the identity and appearance of the individual and to cause the individual to superficially resemble another person, such as a politician or an athlete.

[0003] 2. Description of the Related Art

[0004] Masks are well known. Examples from the prior art include paper masks covering the entire head of the wearer and bearing indicia, such as U.S. Pat. No. 2,000,242 to Manning issued Oct. 3, 1933, U.S. Pat. No. 2,795,796 to Ray issued Jun. 18, 1957, U.S. Pat. No. 2,853,710 to Swann issued Sep. 30, 1958, and U.S. Pat. No. 3,599,240 to Shapur issued Aug. 17, 1971.

[0005] Other examples from the prior art utilize woven fabric screens that obscure the eyes of the wearer, including U.S. Pat. No. 5,035,004 to Koester issued Jul. 31, 1991, U.S. Pat. No. 5,546,604 to Geller issued Aug. 20, 1996, and U.S. Pat. No. 6,662,376 B2 to Cook issued Dec. 16, 2003.

[0006] U.S....

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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