Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
a technology of developing solution and developing solution, which is applied in the direction of photomechanical equipment, instruments, photosensitive material processing, etc., can solve the problems of complex concentration control of the developing solution, the inability to use the developing solution directly containing the deposited tbah in the development step, and the inability to solve the inability to achieve the effect of suppressing the tbah
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[0100]The developing solution for photolithography of the present invention is more specifically explained with respect to Examples in the following, but the present invention should nevertheless not be limited to Examples below.
TBAH Deposition Preventing Effect by Adding Water-Soluble Organic Solvent
Preparation of Developing Solution
[0101]Developing solutions of Examples 1 to 5 were respectively prepared by dissolving tetrabutylammonium hydroxide (TBAH) and isopropanol (IPA) as a water-soluble organic solvent into purified water (deionized water) in the concentrations shown in Table 1. The numerical values shown in Table 1 are expressed in terms of % by mass. Furthermore, a developing solution of Comparative Example 1 was prepared by dissolving only tetrabutylammonium hydroxide (TBAH) into deionized water in the concentration shown in Table 1. Besides, a developing solution of Comparative Example 2 was prepared by dissolving only tetramethylammonium hydroxide (TMAH) into deionized ...
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