The invention discloses a method for relieving capsicum
autotoxicity effect, promoting
plant growth and development and increasing yield and improving quality of fruits based on exogenous
silicon, which comprises the following steps: selecting capsicum seeds, soaking the capsicum seeds in
warm water at 55 DEG C for 30 minutes, accelerating
germination,
sowing the seeds in a 72-hole tray after the seeds are white,
transplanting seedlings into a
nutrition pot filled with a substrate when three leaves and one core are formed, and
transplanting the seedlings into a
seedling tray after the seedlings are grown; the growth environment temperature is 26 DEG C / 16 DEG C, the photoperiod is 12 h / 12 h, 5 days after
seedling recovery, 1 / 2 of a Japanese Kawasaki pepper
nutrient solution is used as a
solvent for root application of
phthalic acid (PA) to induce
autotoxicity stress of the peppers, meanwhile, the
nutrient solution is used as a
solvent for root application of exogenous nano SiO2, and the treatment capacity of each time of
irrigation is 150 mL. After the flower stage is started, the
nutrient solution is doubled, and the
irrigation treatment capacity of each time is changed to 300mL. The root application of exogenous nano SiO2 can effectively promote the growth and development, photosynthetic process,
oxidation resistance, water
metabolism, carbon and
nitrogen metabolism and mineral element absorption of pepper plants under
autotoxicity stress, promote the growth and development, yield increase and quality improvement of pepper fruits, and significantly relieve the autotoxicity stress degree of PA on pepper.