Photographic light-sensitive material processing device

Abstract

There are multiple treating tanks containing same kind of treating liquid in the development part of the device for processing photographic material. There are at least one tank, which has the overflow opening on the upper part of side wall as well as at least one tank, which has the overflow opening on the upper part of side wall and liquor drainage opening on the lower part of side wall. The overflow opening on one tank is connected to the liquor drainage opening on other tank through the connection part enveloping the opening. The height of the overflow on one tank is higher than the height the liquor drainage opening on another tank. Thus, the treating liquid outflowing from one tank is fed through the connection part to another tank with drainage opening. Thus, the invention makes the height of liquid level in each tank keep the certain height accurately.

Description

technical field [0001] The present invention relates to an apparatus for processing photographic photosensitive materials such as film or photographic paper (hereinafter collectively referred to as photographic photosensitive material processing apparatus). More specifically, it relates to a photographic photosensitive device in which a display unit is provided in the photographic processing apparatus, and the liquid level of a plurality of adjacent processing tanks containing a processing liquid such as a developing liquid and a fixing liquid can be appropriately maintained. Material Handling Units. Background technique [0002] Such as Figure 4 As shown, the current development processing device is provided with an insertion part 1 for feeding a film P as a photosensitive material, a development part 2 for developing and processing the film P, a drying part 3 for drying the developed film P, and a storage place for drying the film P. storage tank 4. In addition, the dev...

AI Technical Summary

Problems solved by technology

In addition, the amount of rise h of the liquid level, for example, does not necessarily increase as the amount of overflow increases, so that it is even more impossible to maintain the height of the liquid level of the processing liquid at a certain height.

At this time, if the slit is used, the liquid level will rise due to the influence of the surface tension of the treatment liquid, or the addition of the wheel frame to the treatment tank, which increases the resistance, and the treatment liquid cannot flow smoothly to the slit, etc.

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