Wet etching equipment

Abstract

A wet etching equipment is composed of such 5 unit sequentially and linearly arrange as substrate bearing chamber, dry conveying region, drying chamber, rinsing chamber and etching region, a lift chamber and a drying conveying belt above the drying chamber, rinsing chamber and etching region.

Description

【Technical field】 [0001] The invention relates to a wet etching device. 【Background technique】 [0002] Wet etching technology has the advantages of low cost, high yield, reliability, and good selectivity to mask and base materials. It is widely used in the etching process of substrates. However, due to the large number of stages in wet etching equipment, the glass substrate transfer process is complicated. Generally, in the process of wet transfer of glass substrates with the first cleaning under high pressure, intense vibration will occur, resulting in abnormal phenomena such as chip chasing and breakage. cause a decrease in productivity. [0003] see figure 1 , is a three-dimensional schematic diagram of a prior art wet etching equipment. The wet etching equipment 10 includes a substrate carrying chamber 111, a buffer chamber 112, a first etching chamber 113, a second etching chamber 114, a third etching chamber 115, a wet transfer area 116, a rinsing chamber 117, a ...

AI Technical Summary

Problems solved by technology

[0009] In order to overcome the problems of inconvenient maintenance, low product qualification rate and large floor space of the wet etching equipment in the prior art, the present invention provides a wet etching equipment that is easy to maintain, high product qualification rate and small floor space

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