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Lithographic apparatus and device manufacturing method

A technology of actuating device and lithography projection, which is applied in the field of device manufacturing and can solve problems such as production decline

Active Publication Date: 2009-04-08
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

A possible disadvantage of this method is the potential for dry spots to form on an element of the projection system that comes into contact with the liquid
Additionally or alternatively, variations in liquid and vacuum flow to remove liquid may take time to process, which may result in a decrease in throughput

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
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Embodiment Construction

[0033] figure 1 A lithographic apparatus according to one embodiment of the invention is schematically represented. The unit includes:

[0034] - an illumination system (illuminator) IL configured to condition a radiation beam PB (eg UV radiation or DUV radiation).

[0035] - a support structure (e.g. a mask table) MT configured to support a patterning member (e.g. a mask) MA and connected to first positioning means PM configured to precisely position the patterning member according to certain parameters;

[0036] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW configured to precisely position the substrate according to certain parameters; and

[0037] - A projection system (eg a refractive projection lens system) PL configured to project the pattern imparted to the radiation beam PB by the patterning means MA onto a target portion C of the substrate W (eg comprising one or more...

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PUM

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Abstract

To facilitate, for example, removal of a substrate between exposures of different substrates, an actuated closing plate is used to replace a substrate, a substrate table, or both, as a part of a boundary of a space in a lithographic apparatus containing liquid without, for example, breaking a seal containing the liquid.

Description

technical field [0001] The invention relates to a photolithography device and a device manufacturing method. Background technique [0002] A lithographic apparatus is an apparatus for applying a desired pattern to a substrate, usually a target portion of the substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, the patterning device may be referred to either as a mask or a reticle, and it may be used to create a circuit pattern formed on an individual layer of the IC. The pattern may be transferred onto a target portion (eg comprising a portion, one or more dies) of a substrate (eg a silicon wafer). Typically this pattern is transferred by imaging onto a layer of radiation sensitive material (resist) applied to the substrate. Generally, a single substrate will contain the entire grid of successively patterned adjacent target portions. Known lithographic apparatuses include so-called steppers, which ir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F7/00H01L21/027
CPCG03F7/70341
Inventor J·-G·C·范德托尔恩C·A·胡根达姆
Owner ASML NETHERLANDS BV