Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Substrate processing apparatus and substrate processing method

A substrate processing device and substrate technology, which is applied in the direction of photolithographic process exposure device, electrical components, semiconductor/solid-state device manufacturing, etc., can solve the problems of polluting the lens of the exposure device, poor shape, and poor exposure pattern size

Active Publication Date: 2009-07-29
SCREEN SEMICON SOLUTIONS CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Components of the resist dissolved in the liquid remain on the surface of the substrate and may cause defects
[0008] In addition, the components of the resist dissolved in the liquid contaminate the lens of the exposure device
As a result, there may be a problem in the size and shape of the exposure pattern.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0082] Next, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. In the following description, the term "substrate" refers to a semiconductor substrate, a substrate for a liquid crystal display device, a substrate for a plasma display, a glass substrate for a photomask, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, etc. .

[0083] figure 1 It is a top view of a substrate processing apparatus according to an embodiment of the present invention.

[0084] exist figure 1 In each of the following drawings, in order to clarify the positional relationship, arrows are attached to indicate the X direction, the Y direction and the Z direction which are perpendicular to each other. The X direction and the Y direction are perpendicular to each other in the horizontal plane, and the Z direction corresponds to the vert...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The substrate processing apparatus includes an indexer module, an antireflection film processing module, a resist film processing module, a cleaning / development processing module, and an interface module. The exposure apparatus is arranged adjacent to the interface module. In the resist film processing module, a resist film is formed on a substrate. Before performing exposure treatment on the substrate in the exposure device, the washing and drying treatment of the substrate is performed in the washing treatment unit of the washing / development treatment module.

Description

technical field [0001] The invention relates to a substrate processing device and a substrate processing method for processing a substrate. Background technique [0002] Substrate processing equipment is used for various processing of semiconductor substrates, substrates for liquid crystal display devices, substrates for plasma displays, substrates for optical disks, substrates for magnetic disks, substrates for magneto-optical disks, and substrates for photomasks. [0003] In such a substrate processing apparatus, generally, a plurality of different processes are continuously performed on one substrate. The substrate processing apparatus described in JP-A-2003-324139 is composed of an indexer module, an anti-reflection film processing module, a resist film processing module, a development processing module, and an interface module. An exposure apparatus as an external apparatus provided separately from the substrate processing apparatus is disposed adjacent to the interfac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027G03F7/38
Inventor 安田周一金冈雅金山幸司宫城聪茂森和士浅野彻鸟山幸夫田口隆志三桥毅奥村刚
Owner SCREEN SEMICON SOLUTIONS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com