Substrate processing apparatus and substrate processing method
A substrate processing device and substrate technology, which is applied in the direction of photolithographic process exposure device, electrical components, semiconductor/solid-state device manufacturing, etc., can solve problems such as poor shape, poor exposure pattern size, and contamination of the lens of the exposure device.
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[0082] Next, a substrate processing apparatus according to an embodiment of the present invention will be described with reference to the drawings. In the following description, the term "substrate" refers to a semiconductor substrate, a substrate for a liquid crystal display device, a substrate for a plasma display, a glass substrate for a photomask, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, a substrate for a photomask, etc. .
[0083] figure 1 It is a top view of a substrate processing apparatus according to an embodiment of the present invention.
[0084] exist figure 1 In each of the following drawings, in order to clarify the positional relationship, arrows are attached to indicate the X direction, the Y direction and the Z direction which are perpendicular to each other. The X direction and the Y direction are perpendicular to each other in the horizontal plane, and the Z direction corresponds to the vert...
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