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Substrate treatment apparatus

A technology of substrate processing device and driving device, which is applied in the direction of transportation and packaging, conveyor objects, discharge tubes, etc., and can solve problems such as becoming cumbersome, complicated work, and difficult to adjust the height accurately

Inactive Publication Date: 2007-10-17
ADVANCED DISPLAY PROCESS ENG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus, there is a problem that the work is complicated and becomes cumbersome
Even though the height of the lift pins can be adjusted with this separately manufactured extra washer, there is the problem that it is difficult to adjust the height precisely

Method used

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Embodiment Construction

[0028] Hereinafter, the constitution and operation of an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

[0029] Referring to FIG. 2, a substrate processing apparatus according to an embodiment of the present invention includes a chamber 100, an upper electrode, an electrode part 110, and a substrate lifting unit. The substrate elevating unit includes: a plurality of elevating pins 120 for supporting the substrate S to elevate or lower the substrate; a pin holder 122 on which the elevating pins 120 are installed; a driving device 136 for generating a driving force; The piston rod 134 is used to transmit the driving force. In addition, it can be seen that the pin carrier plate 122 is disposed on the outside and underside of the chamber 100 .

[0030] Referring to FIG. 3 , in particular, in this embodiment it can be seen that the lift pin 120 is installed and penetrates the pin carrier plate 122 . In addition, the o...

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PUM

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Abstract

The present invention relates to a substrate treatment apparatus, and more particularly, to a substrate treatment apparatus, wherein lift pins can be installed while the levels of the lift pins are easily adjusted using a tool such as a wrench. A substrate treatment apparatus of the present invention comprises a chamber; a pin plate provided inside or outside the chamber; a driving means for lifting or lowering the pin plate; and at least one lift pin that penetrates through the pin plate so that the lift pin is coupled to the pin plate, and has a tool insertion recess formed at a lower end of the lift pin.

Description

technical field [0001] The present invention relates to a substrate processing apparatus, and more particularly to a substrate processing apparatus in which lift pins can be installed and the height of the lift pins can be easily adjusted using a tool such as a wrench. Background technique [0002] Typically, the fabrication of semiconductor devices and LCD panels requires plasma treatment of substrates. In such plasma processing of a substrate, the substrate is loaded and fixed in a vacuum chamber, and process gas and high-frequency power are applied to the vacuum chamber to generate plasma, thereby performing predetermined plasma processing. [0003] A conventional substrate processing apparatus is described with reference to FIG. 1 . The vacuum chamber 10 includes an upper electrode 12 to which a process gas is applied and an electrode portion 20 to which a high-frequency power is applied. [0004] The substrate S is loaded into the vacuum chamber 10 from the outside by...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/00H01L21/67H01L21/677
CPCH01J37/32431H01L21/68742H01L21/687
Inventor 全宗镇
Owner ADVANCED DISPLAY PROCESS ENG CO LTD