Substrate cleaning apparatus

A technology for cleaning equipment and substrates, applied in cleaning methods and utensils, cleaning methods using liquids, electrical components, etc., can solve the problem of pure water turning into droplets or mist, etc., and achieve the effect of preventing backflow pollution

Active Publication Date: 2012-01-25
EBARA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, even when the substrate takes 300min -1 When turning at or lower speed, when the pure water hits the fixed cover, the pure water may turn into liquid droplets or mist

Method used

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  • Substrate cleaning apparatus
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  • Substrate cleaning apparatus

Examples

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Embodiment Construction

[0048] A substrate cleaning apparatus according to an embodiment of the present invention will be described below with reference to the accompanying drawings. Like or corresponding parts are denoted by like or corresponding reference numerals.

[0049] figure 1 is a schematic vertical sectional view of the substrate cleaning apparatus according to the first embodiment of the present invention, and figure 2 yes figure 1 A plan view of the substrate cleaning apparatus shown in .

[0050] Such as figure 1 As shown, the substrate cleaning apparatus includes a substrate holding mechanism 1 arranged to hold a substrate W horizontally, a motor (rotation mechanism) 2 arranged to rotate the substrate W around its own central axis by the substrate holding mechanism 1 , A rotary cover 3 and a front nozzle 4 for supplying pure water as a cleaning liquid to the surface (front surface) of the substrate W are provided. In addition to pure water, chemical solutions can also be used a...

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PUM

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Abstract

A substrate cleaning apparatus is used to clean a substrate with a cleaning liquid. The substrate cleaning apparatus includes a substrate holding mechanism configured to hold a substrate horizontally, a rotating mechanism configured to rotate the substrate held by the substrate holding mechanism, a liquid supply nozzle for supplying a cleaning solution to the substrate, and a spin cover provided around the substrate and rotatable at substantially the same speed as the substrate. The spin cover has an inner circumferential surface shaped so as to surround the substrate. The inner circumferential surface is, from a lower end to an upper end thereof, inclined radially inwardly.

Description

technical field [0001] The present invention relates to a substrate cleaning apparatus for cleaning a substrate by supplying a cleaning liquid such as pure water or a chemical solution to the substrate and drying the cleaned substrate. Background technique [0002] In the process of manufacturing semiconductor devices, cleaning of substrates is an important process for improving product yield. Such a substrate cleaning process is performed, for example, after a substrate polishing process to remove excess debris from the substrate. in the attached picture Figure 28 and 29 An example of a substrate cleaning apparatus is shown. Such as Figure 28 and 29 As shown, the substrate cleaning apparatus has a substrate holding mechanism 100 arranged to hold a substrate W; a motor 101 arranged to rotate the substrate holding mechanism 100; a fixed cover 102 arranged around the substrate W; and a nozzle 103 for supplying pure water as a cleaning liquid onto the surface of the subst...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/02H01L21/306B08B3/00
Inventor 森泽伸哉松田尚起小岛靖
Owner EBARA CORP
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