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A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

A controller and equipment technology, applied in the field of device manufacturing

Active Publication Date: 2013-01-23
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although such systems improve substrate temperature control and handling, evaporation of the immersion liquid may still occur

Method used

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  • A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
  • A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
  • A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

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Embodiment Construction

[0036] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0037] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0038] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM for precisely positioning the patterning device MA according to determined parameters;

[0039] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and configured for a second positioning of the substrate W precisely according to determined parameters device PW connected; and

[0040] A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion C of t...

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Abstract

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and / or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Description

technical field [0001] The present invention relates to a lithography equipment, a method of controlling the lithography equipment and a device manufacturing method. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterne...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/70716G03F7/70725G03F7/70775G03F7/2041H01L21/0274H01L21/0275
Inventor M·K·斯达文卡N·R·凯姆普M·H·A·里恩德尔斯P·M·M·里布莱格特斯J·C·H·缪尔肯斯E·H·E·C·尤米伦R·莫尔曼M·瑞鹏S·舒勒普伍G-J·G·J·T·布朗德斯K·斯蒂芬斯J·W·克洛姆威吉克R·J·梅杰尔斯F·伊凡吉里斯塔D·贝山姆斯李华M·乔詹姆森P·L·J·岗特尔F·W·贝尔E·威特伯格M·A·J·斯米特斯马振华
Owner ASML NETHERLANDS BV
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