Power supply device for sputter ion pumps

Abstract

The invention discloses a power supply device for ion pumps, which comprises a switching element, a sensing element, a booster transformer, a control circuit and a rectifier circuit, wherein the switching element is provided with a first end, a second end and a third end; the sensing element is connected with the second end of the switching element; the booster transformer comprises a primary winding and a secondary winding, the polarity of the same name end of the primary winding is opposite to that of the secondary winding, one end of the primary winding is connected to a direct current power supply, and the other end is connected to the third end of the switching element; the control circuit is used for generating a switching control signal to be applied to the first end of the switching element on the basis of the flyback voltage generated by the primary winding and the voltage on the sensing element; the switching element is connected or disconnected under the control of the switching control signal, thereby generating an output voltage at the output end of the secondary winding of the booster transformer; and the rectifier circuit is used for filtering the output voltage generated by the output end of the secondary winding of the transformer. The power supply device has the advantages of high efficiency, small size and light weight, and the power range meets the requirement for the power of the sputter ion pump power supply.

Description

Technical field [0001] The invention relates to a sputtering ion pump power supply, in particular to a sputtering ion pump power supply based on the principle of a single-ended flyback switching power supply, and a vacuum ion pump power supply with real-time display and interlock protection requirements for the working current and voltage of the vacuum ion pump power supply Application areas. Background technique [0002] The sputter ion pump is the most used vacuum pump in the ultra-high vacuum acquisition system. The internal core components are the anode and the cathode. The anode is a thin-walled stainless steel cylinder, and the cathode is two titanium plates placed on both sides of the anode, so the sputter ion pump is referred to as titanium pump. When it is working, an external permanent magnet provides a magnetic field line parallel to the anode cylinder with an intensity of 1000-1500 Gauss. A 3-7kV DC high voltage is directly applied between the anode and the cathode t...

AI Technical Summary

Problems solved by technology

[0005] Most of the traditional ion pump power supplies can only provide simple high-voltage power supply functions. The mode of obtaining high voltage is usually the traditional linear transformer boost mode. Although the structure is simple, it has large volume and weight, low efficiency and poor stability; And it lacks the monitoring and alarm functions for voltage and current signals, so it is not suitable for applications in accelerators and other fields that require online monitoring of the vacuum state.

In the latest technology, there are also solutions that use switching power supply technology to replace linear transformer boost technology, such as the technology used in the Chinese patent (00112595.8) "Intelligent Sputter Ion Pump Power Controller", although it also has the monitoring of voltage and current signals and alarm function, but the power supply mode is single, it cannot meet the requirements of 24-hour uninterrupted work when the mains power is cut off, and the latest electronic technology and superior electronic components are not used, the circuit structure is complicated, and the efficiency is not high

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