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Applicant self-citation analysis system

An analysis system and applicant's technology, applied in the field of patent analysis system, can solve the problem of rare analysis of applicant's self-citation, and achieve the effect of intuitive display graphics and systematic analysis

Inactive Publication Date: 2011-04-06
J Z M C INTPROP DATA SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0003] Most of the existing related patent applications on patent citations take the designated patent as the initial analysis object, which only reflects the citation relationship between patents, and lacks the analysis of the technical relationship between applicants, while the analysis of applicants’ self-citation is more important. Rare, such as the patent application number CN200610169633, which discloses a display method of patent citation information, but its display content is only the citation patent collection of the selected patent

Method used

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Embodiment Construction

[0008] Such as figure 1 Shown is a block diagram of the applicant's self-citation analysis system described in the present invention. The present invention provides an applicant self-citation analysis system. The applicant self-citation analysis system provides at least one client computer 10 , a database 20 and an application software server 30 . The client computer 10 therein includes an interactive user interface providing an applicant selection module 101 and an applicant self-reference graph adjustment module 102 . The database 20 is used for accessing patent data and mutual citation relationships among patents. The application software server 30 includes a patent download engine 301, an applicant self-citation relationship import module 302, and an applicant self-citation analysis module 303, wherein the patent download engine 301 is used to download patents from the database 20, and the applicant self-citation relationship import module 303. Module 302 is used to impo...

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Abstract

The invention provides an applicant self-citation analysis system. The applicant self-citation analysis system is provided with at least one client computer, a database and an application software server, wherein the client computer comprises an interactive user interface for providing an applicant selection module and an applicant self-citation graph adjustment module; and the application software server comprises a patent downloading engine, an applicant self-citation relationship import module and an applicant self-citation analysis module. Through the system, applicant self-citation analysis is more systematic, the displayed graph is more visual, and the effect of knowing applicant internal technical association is achieved.

Description

technical field [0001] The invention relates to a patent analysis system, in particular to an applicant self-citation analysis system. Background technique [0002] Generally speaking, a U.S. patent specification usually cites 5 to 6 U.S. patent references earlier than the patent, and it usually takes 5 years or more for a patent to be widely cited from the initial citation, while 70 Around % of patents are never cited or cited only once or twice. It is also common for applicants to apply for patents that cite their own previous patents. By analyzing the relationship between applicants’ self-citations, it is possible to better understand the internal correlations of technologies owned by applicants. [0003] Most of the existing related patent applications on patent citations take the designated patent as the initial analysis object, which only reflects the citation relationship between patents, and lacks the analysis of the technical relationship between applicants, while ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/30G06F3/048
Inventor 唐向东魏国柱
Owner J Z M C INTPROP DATA SCI & TECH
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