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Device for clamping reflector at high accuracy

A technology of clamping device and mirror, applied in the direction of exposure device, installation, optics, etc. in the photoengraving process, can solve the problems such as failure to effectively solve the influence of gravity, achieve accuracy guarantee, solve the influence of device accuracy, Overcome the effect of clamping device over-restraint

Inactive Publication Date: 2012-06-13
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this technology is more suitable for the clamping of lenses. For large-diameter mirrors, it cannot effectively solve the influence of gravity. The support and compression structures in this technology are all to make the gravity deformation more uniform.

Method used

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  • Device for clamping reflector at high accuracy
  • Device for clamping reflector at high accuracy
  • Device for clamping reflector at high accuracy

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Embodiment 1: Below by reference Figures 1 to 10 A first embodiment of the present invention will be described.

[0030] A. The composition of the Fizeau interferometer (see attached figure 1 ). In the first example, the Fizeau interferometer is a precision instrument used for high-precision surface shape detection. Its optical system is a typical Fizeau-type interference optical path, and the reference wavefront formed by the reference surface is used to measure the optical element to be tested. surface accuracy.

[0031] For ultra-high-precision instruments such as lithography machine objective lenses, gravity deformation has a great impact on the performance of its components, especially when the optical axis of the optical component is not perpendicular to the gravity. In this regard, the optical axis of the optical element is required to be vertical when detecting the surface shape of the optical element in the objective lens of the lithography machine. In gen...

Embodiment 2

[0050] Embodiment 2: Below by reference Figures 11 to 15 A second embodiment of the present invention will be described.

[0051] A. The composition of the mirror clamping structure (see attached Figure 11 , attached Figure 12 ). In the first embodiment of the present invention, a three-point support form is adopted, and a third-order Zernike surface error will be generated under the action of gravity. Due to the low order, the compensation effect on gravity deformation is relatively rough. Aiming at this problem, the second embodiment of the present invention makes a corresponding design.

[0052] Figure 11 It is a schematic diagram of the clamping structure of the reflector in the interferometer used to describe the second example of the present invention. The compression structure 11, the positioning support structure 20 and the elastic support structure 112 are evenly distributed at 30 degrees, which is in the form of multi-point support. This distributed support ...

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Abstract

The invention relates to a device for clamping a reflector at high accuracy, belonging to the field of optical element clamping devices in ultra-high-accuracy optical element detection equipment. The device solves the problem in clamping the reflector of an ultra-high-accuracy interferometer system. The device mainly comprises a fixed support, an inner ring of a mirror frame, an outer ring of themirror frame, location support structures and compression structures, wherein the inner ring and the outer ring of the mirror frame form the mirror frame; the reflector is fixed in the mirror frame, and keeps direct contact with the inner ring of the mirror frame; the inner ring of the mirror frame is fixed on the outer ring of the mirror frame through the location support structure and the compression structure; the location support structures and the compression structures are respectively distributed uniformly at an angle of 120 degrees; the outer ring of the mirror frame is fixed on the fixed support; and the fixed support is fixed on a bottom plate through location holes in symmetrical arrangement. The device is widely used for clamping optical elements, such as reflectors, lenses and the like, in the ultra-high-accuracy optical element detection equipment, eliminates the influence of the gravity deformation on the accuracy of the device, and solves the problem of over-constraintin the prior art.

Description

technical field [0001] The invention belongs to ultra-high-precision optical element detection equipment, in particular to a clamping device for optical elements such as mirrors or lenses in ultra-precision optical equipment with very high requirements on the surface shape of the optical element. Background technique [0002] Ultra-high-precision interferometers are usually used to detect the surface shape of optical components. To achieve such a high detection accuracy also puts forward high requirements on the accuracy of the interferometer itself. For large-aperture optical components, its gravity deformation becomes particularly important in high-precision applications, and how to compensate the influence of gravity deformation on the surface shape of optical components becomes an important factor to achieve high-precision detection. [0003] Lithography equipment is the core of integrated circuit production equipment in the electronics industry. It uses an objective len...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B7/182G02B7/00
Inventor 王平田伟王汝冬王立朋隋永新杨怀江
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI