Device for clamping reflector at high accuracy
A clamping device and mirror technology, which are applied to the exposure device, installation, optics and other directions of the photoengraving process, can solve problems such as failure to effectively solve the influence of gravity, achieve accuracy guarantee, overcome the over-restraint of the clamping device, The effect of resolving the effects of device accuracy
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Embodiment 1
[0029] Embodiment 1: Below by reference Figures 1 to 10 A first embodiment of the present invention will be described.
[0030] A. The composition of the Fizeau interferometer (see attached figure 1 ). In the first example, the Fizeau interferometer is a precision instrument used for high-precision surface shape detection. Its optical system is a typical Fizeau-type interference optical path, and the reference wavefront formed by the reference surface is used to measure the optical element to be tested. surface accuracy.
[0031] For ultra-high-precision instruments such as lithography machine objective lenses, gravity deformation has a great impact on the performance of its components, especially when the optical axis of the optical component is not perpendicular to the gravity. In this regard, the optical axis of the optical element is required to be vertical when detecting the surface shape of the optical element in the objective lens of the lithography machine. In gen...
Embodiment 2
[0050] Embodiment 2: Below by reference Figures 11 to 15 A second embodiment of the present invention will be described.
[0051] A. The composition of the mirror clamping structure (see attached Figure 11 , attached Figure 12 ). In the first embodiment of the present invention, a three-point support form is adopted, and a third-order Zernike surface error will be generated under the action of gravity. Due to the low order, the compensation effect on gravity deformation is relatively rough. Aiming at this problem, the second embodiment of the present invention makes a corresponding design.
[0052] Figure 11 It is a schematic diagram of the clamping structure of the reflector in the interferometer used to describe the second example of the present invention. The compression structure 11, the positioning support structure 20 and the elastic support structure 112 are evenly distributed at 30 degrees, which is in the form of multi-point support. This distributed support ...
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