Method for using ultraviolet light to irradiate OTS-modified ITO glass substrate

A technology of glass substrate and ultraviolet light, which is applied in the production field of ITO glass substrate, can solve the problems of uneven functionalization, incomplete cleaning, easy damage to the substrate surface deposition environment, etc., and achieve uniform functionalization, less defects and strong bonding force Effect

Inactive Publication Date: 2012-12-19
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

There are many shortcomings in the substrate cleaning method used in the past, such as incomplete cleaning, uneven functionalization, and easy damage to the deposition environment on the substrate surface
[0004] So far, there has been no domestic treatment of ITO glass substrates with a combination of ultraviolet light treatment and self-assembled monolayer, and there are relatively few related reports abroad.

Method used

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  • Method for using ultraviolet light to irradiate OTS-modified ITO glass substrate
  • Method for using ultraviolet light to irradiate OTS-modified ITO glass substrate
  • Method for using ultraviolet light to irradiate OTS-modified ITO glass substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046]1) Cut the ITO glass substrate with a glass knife, the size is 1cm×2.5cm, put the cut ITO glass substrate into the commercially available detergent solution and ultrasonically vibrate for 10min to initially remove the impurities and organic matter on the surface, Next, take the ITO glass substrate out of the detergent solution and rinse it with deionized water; then put it into the acetone solution, and perform ultrasonic cleaning for 10 minutes again to further remove the stubborn organic components on the surface, then take the ITO glass substrate out again and use Rinse it with deionized water; finally put it into an ethanol solution for a third 10min ultrasonic cleaning, take it out and rinse it with deionized water to further improve the cleanliness of the substrate surface. Finally, the surface of the cleaned ITO glass substrate is blown dry with nitrogen gas, that is, the ITO glass substrate after cleaning in the previous stage.

[0047] Put the cleaned ITO glass ...

Embodiment 2

[0065] 1) Cut the ITO glass substrate with a glass knife, the size is 1cm×2.5cm, first put the cut ITO glass substrate into the detergent solution and oscillate ultrasonically for 10 minutes to remove the impurities and organic matter on the surface initially, then Take the ITO glass substrate out of the detergent solution and rinse it with deionized water; then put it into the acetone solution and perform ultrasonic cleaning for 10 minutes again to further remove the stubborn organic components on the surface, then take the ITO glass substrate out again and use deionized Rinse it with water; finally put it into an ethanol solution for a third 10min ultrasonic cleaning, and rinse it with deionized water after taking it out to further improve the cleanliness of the substrate surface. Finally, the surface of the cleaned ITO glass substrate is blown dry with nitrogen gas, that is, the ITO glass substrate after cleaning in the previous stage.

[0066] Put the cleaned ITO glass sub...

Embodiment 3

[0070]1) Cut the ITO glass substrate with a glass knife, the size is 1cm×2.5cm, first put the cut ITO glass substrate into the detergent solution and oscillate ultrasonically for 10 minutes to remove the impurities and organic matter on the surface initially, then Take the ITO glass substrate out of the detergent solution and rinse it with deionized water; then put it into the acetone solution and perform ultrasonic cleaning for 10 minutes again to further remove the stubborn organic components on the surface, then take the ITO glass substrate out again and use deionized Rinse it with water; finally put it into an ethanol solution for a third 10min ultrasonic cleaning, and rinse it with deionized water after taking it out to further improve the cleanliness of the substrate surface. Finally, the surface of the cleaned ITO glass substrate is blown dry with nitrogen gas, that is, the ITO glass substrate after cleaning in the previous stage.

[0071] Put the cleaned ITO glass subs...

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Abstract

The present invention discloses a method for using ultraviolet light to irradiate a modified ITO glass substrate. The method is characterized by comprising the following steps of: (1) cleaning an ITO glass substrate and placing the ITO glass substrate in an ultraviolet light lamp in a right-side-up way for 1 to 30 minutes of irradiation; (2) preparing OTS-toluene solution according to volume ratio, and placing the well irradiated ITO glass substrate into the prepared solution for immersion for 1 second to 40 minutes, and taking out and cleaning with acetone, and drying; and (3) again placing the ITO glass substrate in the ultraviolet light lamp in the right-side-up way for 1 to 50 minutes of irradiation to obtain a functionalized ITO glass substrate with the surface being completely hydrophilic. The method combines two technologies, making the surface cleanliness of the ITO glass substrate achieve an atom level, and making the functionalization of the surface uniform and complete, andalso the method is simple in technological process and convenient in operation.

Description

technical field [0001] The invention belongs to the production field of ITO glass substrates, and relates to a method for processing ITO glass substrates, in particular to a method for modifying ITO glass substrates by irradiating OTS with ultraviolet light. Background technique [0002] In the process steps of depositing functional ceramic films on ITO glass substrates, in order to effectively remove all kinds of dirt on the substrate before film deposition, to achieve surface cleaning, and to form the micro-environment required for film deposition, the substrate is often cleaned. Create conditions for the next step of thin film deposition. The cleaning process mainly removes all kinds of dust and particulate dirt, alkaline ions, and corrosive inorganic and organic pollutants that hinder the realization of thin film deposition. Cleaning processes require many different types of chemicals that also exhibit different mechanisms of action in the cleaning process. [0003] At...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/28
Inventor 谈国强程蕾苗鸿雁尹君
Owner SHAANXI UNIV OF SCI & TECH
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