Method for manufacturing semiconductor device

Abstract

The invention discloses a method for manufacturing a semiconductor device, comprising the steps of: providing a semiconductor substrate on which a first gate structure located in the core area and a second gate structure located in the peripheral area are formed; forming a first photoresist layer in the core area; performing pocket implantation and lightly doped drain implantation in the peripheral area to form a second pocket implantation region and a second lightly doped region in the semiconductor substrate on both sides of the second gate structure; removing the first photoresist layer; performing pre-amorphization implantation to form an amorphous layer in the semiconductor substrate not covered by the first gate structure and the second gate structure; forming a second photoresist layer in the peripheral area; and performing pocket implantation and lightly doped drain implantation in the core area to form a first pocket implantation region and a first lightly doped region in the semiconductor substrate on both sides of the first gate structure. The method of the invention can help reduce junction mutability and junction capacitance of the core area while ensuring reliability of hot electron injection of devices in the peripheral area.

Description

technical field [0001] The invention relates to a semiconductor manufacturing process, in particular to a method for manufacturing a semiconductor device. Background technique [0002] With the increasing demand for high integration and high performance of VLSI, the critical dimensions of semiconductor devices are getting smaller and smaller. However, when the channel length is shortened to be comparable to the sum of the depletion layer widths of the source and drain, the perturbation caused by the channel edges (such as the source, drain, and insulating region edges) becomes more significant, The performance of semiconductor devices will deviate from the original long channel characteristics. For example, in short-channel conditions, the threshold voltage (i.e., the turn-on voltage of the gate) decreases as the drain voltage increases, which adversely affects the threshold voltage control and leakage characteristics of semiconductor devices. The above-mentioned influence...

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Problems solved by technology

However, when the channel length is shortened to be comparable to the sum of the depletion layer widths of the source and drain, the perturbation caused by the channel edges (such as the source, drain, and insulating region edges) becomes more significant, The performance of semiconductor devices will deviate from the original long channel characteristics

For example, in short-channel conditions, the threshold voltage (i.e., the turn-on voltage of the gate) decreases as the drain voltage increases, which adversely affects the characteristics of semiconductor devices such as threshold voltage control and leakage

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