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Optical tracing monitoring method for quickly inverting growth thickness of thin film

A technology for thin film growth and optical monitoring, applied in the direction of using optical devices, measuring devices, instruments, etc., can solve the problems of difficult and intuitive film optical characteristics characterization of film growth thickness inversion function, etc., to overcome the inability to obtain intuitive Optical properties of film systems and the effect of inability to perform rapid thickness inversion of film growth

Active Publication Date: 2013-03-20
SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] Therefore, under the requirement of high-precision monitoring of optical thin films with irregular thickness, it is difficult for the general optical monitoring and tracking method to have both intuitive characterization of film optical characteristics and rapid film growth thickness inversion function.

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  • Optical tracing monitoring method for quickly inverting growth thickness of thin film
  • Optical tracing monitoring method for quickly inverting growth thickness of thin film
  • Optical tracing monitoring method for quickly inverting growth thickness of thin film

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Embodiment Construction

[0028] In order to further illustrate embodiments of the present invention, Figure 6 A specific tracking example of the growth monitoring of a three-layer AR coating with an irregular film system is given. The dotted line represents the theoretically designed tracking image, and the dashed line represents the expected tracking of the next film layer after the growth of the current film layer is completed. The trace image, the solid line represents the actual trace image of each layer. The equivalent phase thickness of each layer during monitoring Maintain equivalent phase thickness to design same. During the monitoring tracking process, the expected tracking image of the first coating layer is the same as the theoretical design tracking image, while the actual tracking image has experienced a transmittance extremum point, and the refractive index n of the coating layer has been corrected. Therefore, the actual tracking image deviates from the theoretical design tracking ...

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Abstract

The invention discloses an optical tracing monitoring method for quickly inverting the growth thickness of a thin film and belongs to the technical field of thin film growth optical monitoring. The optical tracing monitoring method comprises the following steps: establishing an optical tracing monitoring mode different from an admittance tracing mode, taking film system transmission rate countdown and film layer equivalent phase thickness as tracing objects, seeing the change of optical characteristics in the growth process of the thin film in the monitoring process and establishing a corresponding relation between a direct transmission rate monitoring signal and the film layer thickness and finishing monitoring the growth thickness of the thin film. The optical tracing monitoring method has the beneficial effects that the theoretical calculation is performed according to design parameters, and an expected tracing image is well done; the expected tracing image is corrected through an extreme point of an actual optical monitoring signal to finish actually tracing the image and obtain actual film layer refractive indexes, thereby correcting the film system design parameters and automatically compensating the thicknesses among different film layers.

Description

technical field [0001] The invention relates to an optical monitoring technology for thin film growth, in particular to an optical monitoring and tracking method for quickly reversing the growth thickness of a thin film. Background technique [0002] The quality of the optical properties of optical thin film growth depends on the precise grasp and control of the refractive index and thickness parameters of the grown film layer. Traditional monitoring methods include time monitoring, quartz crystal oscillator monitoring, and optical monitoring of light intensity values. The former two cannot obtain the refractive index of the film layer, and there are large errors in the control of the optical thickness of the film layer. The optical monitoring method can obtain the refractive index and thickness growth information of the film layer at the same time, and is considered to be one of the most effective methods in the growth monitoring of optical thin films. Generally speaking, ...

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Application Information

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IPC IPC(8): G01B11/06
Inventor 蔡清元郑玉祥刘定权罗海瀚
Owner SHANGHAI INST OF TECHNICAL PHYSICS - CHINESE ACAD OF SCI