Device and method for measuring temperature and concentration of multi-component welding arc plasma

Abstract

The invention provides a method for measuring the temperature and concentration of multi-component welding arc plasma, including building a measuring device, the measuring device includes a neutral filter, a narrow-band filter, a macro lens, a CMOS high-speed camera, and a fixed The tripod of the CMOS high-speed camera, wherein the macro lens is installed on the CMOS high-speed camera, and the narrow-band filter and neutral filter are sequentially arranged on the outward direction of the macro lens. The invention selects the atomic spectrum line of a certain element and the ion spectrum line of primary ionization, overcomes the requirements of the traditional method on the physical properties of the components, and is applied in the field of welding arc spectrum diagnosis, and can be widely used in welding arc plasmas of different components Measurement of temperature and concentration.

Description

technical field [0001] The invention relates to the field of temperature measurement and control, in particular to a method for measuring welding arc plasma temperature and concentration and a plasma collection device based on high-speed photography. Background technique [0002] The temperature and concentration of arc plasma are two important and basic parameters to describe the welding process, and are also the basic characterization of various physical and chemical reactions and metallurgical reactions in the welding arc zone, which directly affect the weld formation and welding quality. Quantitative analysis of these reaction parameters and monitoring of the welding process is of great significance for controlling weld formation and improving welding quality. The premise of the current research on welding arc plasma is to assume that there is only one component in the arc, and to measure the temperature, mainly using spectroscopic methods. Spectroscopy is a measurement...

AI Technical Summary

Problems solved by technology

The imaging system in this device is composed of multi-level optical paths, which requires high precision and is also subject to certain restrictions in application.

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