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A Method for Capacitance Extraction of Interconnect Structure

A technology of interconnection structure and capacitance, which is applied in the fields of electrical digital data processing, instrumentation, calculation, etc., can solve the problems of discontinuity of the conductor surface of the interconnection structure, and it is difficult to accurately reflect the real characteristics of the variable capacitance, so as to overcome the discontinuity of the conductor surface Effect

Active Publication Date: 2016-12-28
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
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Problems solved by technology

[0008] The technical problem to be solved by the present invention is to provide a method for extracting the capacitance of the interconnection structure, which is used to solve the problem that the conductor surface of the interconnection structure in the prior art is discontinuous, and the change of the conductor surface area cannot be reflected in time. Extraction of defects that are difficult to accurately reflect the true characteristics of variable capacitance

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  • A Method for Capacitance Extraction of Interconnect Structure
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  • A Method for Capacitance Extraction of Interconnect Structure

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Embodiment Construction

[0028] In order to make the technical problems, technical solutions and advantages to be solved by the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0029] Conductor capacitance is mainly affected by the charge distributed on the surface of the conductor. Therefore, when studying the capacitance extraction under process changes, random changes on the conductor surface must be considered. The boundary element method is the main method to solve the deterministic structural capacitance extraction problem. It first discretizes the surface of the conductor or the surface of the medium area, and then solves the boundary integral equation to obtain the surface boundary element charge under a specific conductor bias setting. For each conductor The total amount of charge obtained is the capacitance value to be solved.

[0030] Based on the boundary element method, it can be assumed that the process variation ...

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Abstract

The invention provides a capacitance extraction method for an interconnection structure. The method is applied to a conductor, a conductor surface comprises a plurality of triangular boundary elements, and at least one variable point is arranged in each triangular boundary element. The method comprises the following steps of: acquiring coordinates of the variable points of each triangular boundary element; setting an independent random variable and a dependent random variable at each variable point, wherein each independent random variable represents a variation in a direction perpendicular to the surface of the corresponding variable point, and each dependent random variable represents force transmitted to the corresponding variable point by a variation in a second direction; adding each independent random variable and the corresponding dependent random variable into the coordinates of the corresponding variable point to form an equivalent conductor surface; and calculating the equivalent capacitance of the equivalent conductor surface. The triangular boundary elements are used for dispersing the conductor surface mainly without increase of the number of random variables; and the variations of the conductor surface can be timely reflected, and real characteristics of varied capacitance can be accurately reflected by capacitance extraction.

Description

technical field [0001] The invention relates to integrated circuit technology, in particular to a method for extracting capacitance from an interconnection structure. Background technique [0002] The interconnection of integrated circuits at the deep submicron and nanoscale has replaced transistors as the main factor determining the performance of integrated circuits. The electromagnetic parasitic effects of interconnections determine the delay time of integrated circuits, and also affect signal integrity and power consumption. Significant, therefore, the electromagnetic parasitic effects of interconnection lines, circuit models and analysis become the focus of computer-aided design of integrated circuits. Interconnection parasitic extraction (parasitic extraction) is the premise of interconnection analysis. It expresses the electromagnetic parasitic effect as circuit elements such as resistance, capacitance and inductance. Among them, the extraction of resistance is relati...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
Inventor 陈岚马天宇叶甜春
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI