Mask table system of six-degree-of-freedom coarse table with photoelectric position detector measurement function

Abstract

The invention discloses a mask table system of a six-degree-of-freedom coarse table with a photoelectric position detector measurement function. The coarse table comprises a coarse table body, a driving device and a coarse table gravity balance component, wherein the coarse table body is arranged outside a refined table and covers the refined table, so that six-degree-of-freedom motion of the coarse table is realized; and the mask table system also comprises a phase sensitive detector (PSD) sensor measurement system for measuring a relative position between the refined table and the coarse table and measuring a relative position between the coarse table and a base. According to the mask table system, the posture of a mask table is adjusted, and the speed, the acceleration and the control bandwidth of the mask table are improved; requirements on high motion precision and high positioning precision are met; therefore, the production rate, the graving precision and the resolution of a photoetching machine are improved; furthermore, the measuring precision and the measuring speed are extremely high; and the mask table system can be suitable for high response speed, high acceleration and high motion positioning precision of the mask table.

Description

technical field [0001] The invention relates to a photolithography machine mask table system, which is mainly used in semiconductor photolithography machines and belongs to the field of semiconductor manufacturing equipment. Background technique [0002] In the production process of integrated circuit chips, the exposure transfer (photolithography) of the design pattern of the chip on the photoresist on the surface of the silicon wafer is one of the most important processes. The equipment used in this process is called a photolithography machine (exposure machine). The resolution and exposure efficiency of the lithography machine greatly affect the characteristic line width (resolution) and productivity of the integrated circuit chip. As the key system of the lithography machine, the motion accuracy and work efficiency of the mask table system largely determine the resolution and exposure efficiency of the lithography machine. [0003] The basic principle of the step-and-s...

AI Technical Summary

Problems solved by technology

When this laminated drive structure is in motion, the double-sided drive structure of the underlying linear motor with single-degree-of-freedom reciprocating motion is supported by air-floating guide rails. The structure is complex and the assembly accuracy is extremely high, which limits the motion accuracy of the mask table and hinders increased its acceleration

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