Stacked type semiconductor structure and manufacturing method thereof
A manufacturing method and semiconductor technology, which can be applied in the fields of semiconductor/solid-state device manufacturing, semiconductor devices, and semiconductor/solid-state device components, etc., and can solve the problems of increasing the area of semiconductor structures.
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[0058] Please refer to FIG. 1 , which illustrates a cross-sectional view of a stacked semiconductor structure according to an embodiment of the present invention. The stacked semiconductor structure 100 includes a first substrate 110, at least one first semiconductor chip 120, a second substrate 130, at least one second semiconductor chip 140, a package 150, and at least one first surface mount device (Surface Mount Device, SMD) 160 and at least one second surface mount component 170.
[0059] The first substrate 110 includes a first substrate 111 , a first circuit layer 112 , a second circuit layer 113 and at least one first conductive hole 114 . The upper surface 111u of the first substrate 111 and the upper surface 112u of the first wiring layer 112 jointly define the upper surface of the first substrate 110 . The first circuit layer 112 and the second circuit layer 113 are respectively formed on the upper surface 111u and the lower surface 111b of the first substrate 111 ...
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