Unlock instant, AI-driven research and patent intelligence for your innovation.

Cross-symmetric-structure photoelastic-modulation interferometer with large optical path difference

A cross-symmetric, elastic light modulation technology, applied in instruments, optical devices, measuring devices, etc., can solve the problems of high modulation optical path, modulation optical path difference, etc., to achieve simple drive control system, improved stability, simple structure Effect

Inactive Publication Date: 2013-09-11
ZHONGBEI UNIV
View PDF4 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] The object of the present invention is to provide a cross symmetric structure elasto-optical modulation interferometer, which generates a periodic driving force through a piezoelectric quartz driver, and utilizes the contour vibration mode of a zinc selenide crystal to generate a two-dimensional coupled longitudinal vibration, thereby obtaining a higher The modulated optical path difference can solve the problem of insufficient modulation optical path difference of the existing elastic optical modulation interferometer

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cross-symmetric-structure photoelastic-modulation interferometer with large optical path difference
  • Cross-symmetric-structure photoelastic-modulation interferometer with large optical path difference
  • Cross-symmetric-structure photoelastic-modulation interferometer with large optical path difference

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] Combine figure 1 It is explained that this specific implementation is realized by adopting the following technical solutions: including a light source 1, an off-axis parabolic mirror 2, a polarizer 3, an analyzer 5, a cross-symmetric elastic modulator 4, and a detector 6; The light modulator 4 is composed of a cross-shaped zinc selenide crystal 7 and four piezoelectric quartz drivers 8; in the direction of the light source 1, an off-axis parabolic mirror 2 is placed to collimate the emitted light, and the polarization direction of the polarizer 3 It is at 45° to the horizontal direction; a cross-symmetrical elastic-light modulator 4 is placed behind the polarizer 3 to perform birefringence modulation on the incident polarized light; the analyzer 5 and a detector are placed in sequence behind the cross-symmetrical elastic-light modulator 4, The polarization direction of the analyzer 5 is 90° with the polarization direction of the polarizer 3; after the modulated birefringe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a cross-symmetric-structure photoelastic-modulation interferometer with large optical path difference. The technical scheme includes that an off-axis parabolic mirror is placed in the direction of light sources to collimate emergent light, and the polarization direction of a polarizer forms a 45-degree angle with the horizontal direction; the cross-symmetric-structure photoelastic-modulation interferometer is placed behind the polarizer to subject incident polarized light to birefringence modulation; the cross-symmetric-structure photoelastic-modulation interferometer is composed of a cross-formed zinc selenide crystal and four piezoelectric quartz drives, and an analyzer and a detector are sequentially arranged behind the cross-symmetric-structure photoelastic-modulation interferometer. The cross-symmetric-structure photoelastic-modulation interferometer with the large optical path difference has the advantages that refractive indexes in the x-axis direction and the y-axis direction are rectified, so that both o-light and e-light are effectively modulated. Since modulation is opposite, the modulated optical path difference is four times of that of a conventional long-bar light modulation interferometer. Besides, compared with the conventional long-bar photoelastic-modulation interferometer, the cross-symmetric-structure photoelastic-modulation interferometer can have center stress maximized, the modulated optical path difference can be improved by one magnitude order and reach the order of magnitude of 100 micrometers.

Description

Technical field: [0001] The invention relates to an interferometer structure, in particular to a elasto-optical modulation interferometer structure capable of generating a large modulation optical path difference. technical background: [0002] Electro-optical, magneto-optical, acousto-optical, and elasto-optical modulating devices that tune the refractive index of materials through electricity, magnetism, ultrasound or stress can be used as interferometers in Fourier transform spectrometers. [0003] The basic principle of the elastic-optical modulation interferometer is that when polarized light passes through the elastic-optical modulation interferometer, two beams of o light and e light with vertical polarization directions are generated. The modulated optical path difference between the two columns of light waves is proportional to the crystal material's The refractive index difference is changed, and the optical path difference is changed for half a period under the drive of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02
Inventor 陈友华张记龙王志斌张瑞王立福王艳超魏海潮陈媛媛李世伟
Owner ZHONGBEI UNIV