mpw chip backside metallization method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- WUXI ZHONGWEI GAOKE ELECTRONICS
- Publication Date
- 2017-10-31
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Abstract
Description
technical field
[0001] The invention relates to a process method, in particular to a MPW (Multi Project Wafer) chip backside metallization method, which belongs to the technical field of integrated circuit manufacturing. Background technique
[0002] In the existing backside metallization process, the main body of the backside metallization is a complete wafer, and the backside metallization of the chip cannot be performed using the conventional wafer backside metallization process technology. This is because the edge of a complete wafer is an incomplete chip, and the existing backside metallization equipment can clamp the edge, and it is acceptable that the edge is not plated with metal or has damage.
[0003] However, for chip-level backside metallization, there is no space for clamping at the edge of the chip, and the tolerable damage is extremely slight, and micron-level damage may completely lead to chip scrapping. At the same time, during the entire production process...