Photo mask manufacturing method, pattern transfer method and flat panel display manufacturing method

Abstract

The present invention provides a photo mask manufacturing method, a pattern transfer method and a flat panel display manufacturing method. Alignment of each area is accurately performed in the photo mask in need of multiple scanning, and the implement number of a photoetching process can be restrained. The photo mask manufacturing method comprises preparing a photo mask blank obtained by forming a first etchant resist film by an upper layer film and a lower layer film which are laminated on the upper layer of a transparent substrate and made from materials which are different in exposure light transmissivity and have etching selectivity; performing a first scanning on the first etchant resist film, forming a first etchant resist pattern of provisional patterns for forming and delimiting areas of an upper layer film pattern and a lower layer film pattern; performing a first etching process on the upper layer film; forming a second etchant resist film on the whole face; performing a second scanning on the second etchant resist film, so as to form a second etchant resist pattern for forming a lower layer film pattern; performing a second etching process on the lower layer film; and performing a third etching process to remove the provisional patterns.

Description

[0001] This application is a divisional application of an invention patent application with an application date of June 17, 2013, an application number of 201310238262.7, and an invention title of "photomask and its manufacturing method, transfer method, and flat panel display manufacturing method". technical field [0002] The present invention relates to a method of manufacturing a photomask having a transfer pattern, a photomask manufactured by the manufacturing method, a pattern transfer method using the photomask, and a flat panel display using the pattern transfer method method. Background technique [0003] In photomasks used in liquid crystal display devices, large-scale integrated circuits, etc., when forming fine patterns, there is a problem that it is necessary to eliminate alignment fluctuations due to manufacturing processes as much as possible and accurately manufacture them. [0004] Patent Document 1 below describes a phase shift mask in which a light-shieldi...

AI Technical Summary

Problems solved by technology

In general, the increase in the drawing process has a great impact on production efficiency, so for photomasks used in the manufacture of large-area devices such as flat panel displays, the reduction in productivity due to the addition of one drawing process cannot be ignored

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