Unlock instant, AI-driven research and patent intelligence for your innovation.

Method and device for forming protrusion by masking on surface of basic material

A mask and base material technology, applied in the field of forming bumps, can solve the problems of difficult large-area and high-speed production, high cost, etc.

Inactive Publication Date: 2016-03-02
SEP株式会社
View PDF8 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, nanoimprinting technology forms nanostructures on the surface of the mold, so that liquid polymers (Polymer) can be used to form nanostructures, but it is difficult to carry out large-scale and high-speed production
[0011] In addition, in a semiconductor process similar to photolithography (Photo-lithography), EUV must be used for nano-patterning, which is a very expensive process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for forming protrusion by masking on surface of basic material
  • Method and device for forming protrusion by masking on surface of basic material
  • Method and device for forming protrusion by masking on surface of basic material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0043] Hereinafter, the present invention will be described in detail with reference to the drawings.

[0044] figure 1 is a sequence diagram of a method of forming bumps through a mask according to an embodiment of the present invention.

[0045] The method for forming protrusions through a mask of the present invention includes: a mask forming step, forming a mask layer on the base material; an etching step, etching the area where the mask is not formed on the base material; and a mask removing step, removing The mask layer, and the mask forming step includes the step of forming at least one or more small masks, and the step of forming at least one or more large masks.

[0046] Small masks and large masks are based on Figure 10 The tables shown are differentiated and have different light transmission characteristics depending on the size. In the case of the first-type protrusions (D1), the thickness may be 10 nm or less, but considering the light transmittance according ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to a method and a device for forming a protrusion by masking and, more specifically, to a method for forming a protrusion by masking, comprising: a mask formation step for forming a mask layer on a basic material; an etching step for etching an area in which a mask is not formed on the basic material; and a mask removal step for removing the mask layer, wherein the mask formation step comprises: a step for forming at least one small mask; and a step for forming at least one big mask.

Description

technical field [0001] The present invention relates to a method and device for forming protrusions by masking, and more particularly relates to a method and device for performing special treatment on the surface of a base material, thereby improving the AR characteristics according to the base material Adjusted anti-reflection function and improved superhydrophobic function. Background technique [0002] Cover windows of flat panel displays such as TVs and computer monitors, cover windows of solar cells, and buildings using touch-enabled displays such as mobile phones and tablet PCs. Exterior glass, eyeglasses, automotive glass, etc. reduce the reflection of light, which can increase the efficiency of equipment and improve visibility. [0003] Generally, when the refractive index difference between the two media at the interface through which light is transmitted is large, the refractive index between the two media and the incident angle and reflection angle are determined...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/34C23C16/04C23C16/44
CPCC23C14/14C23C14/541C23C16/06C23C16/56C23C14/04C23C14/34C23C16/04C23C16/44C23C16/042C23F4/00H01J37/3244H01J37/32522
Inventor 李相老罗钟周朴明渐金明根金允焕徐在亨岳昕李智英
Owner SEP株式会社