Supporting device used in process of polishing toenail plates or coating surfaces of toenail plates with fluid

A surface coating and support device technology, applied in manicure or pedicure tools, clothing, applications, etc., can solve problems such as difficult to change the position and angle, affect the efficiency and effect of trimming, and affect the effect of use, etc., to achieve the goal of using Flexible, compact structure, and increased competitiveness

Active Publication Date: 2016-06-08
XUZHOU UNIV OF TECH
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, when grooming the toenail plate or applying fluid to its surface, it is necessary to separate the five fingers and perform grooming work on each toe individually. However, people in this state for a long time will not only get tired easily, but also affect the trimming efficiency And effect, there are fixed finger splitters on the market, but this kind of finger splitter keeps the toes in one state for a long time, and it is difficult to change the position and angle. In actual operation, the toes sometimes need to move back and forth, up and down or change Angle, because it cannot be adjusted, it will affect the use effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Supporting device used in process of polishing toenail plates or coating surfaces of toenail plates with fluid
  • Supporting device used in process of polishing toenail plates or coating surfaces of toenail plates with fluid
  • Supporting device used in process of polishing toenail plates or coating surfaces of toenail plates with fluid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] Below in conjunction with embodiment the present invention is further described.

[0029] Such as Figure 1-Figure 4 Shown is a support device for modifying the nail plate or coating fluid on its surface, which includes a cylindrical support body 1, which is rotatably mounted on a bracket 6; The support part 4 is composed of a rotating cylinder 5, the toe support part 4 is located in the upper half of the support body 1, the toe support part 4 is a semi-cylindrical body whose lower part is a plane and the upper part is an arc surface, and the toe support part 4 The upper part is evenly distributed with five finger-pointing grooves 2 that are transparent at both ends corresponding to the human toes. The direction of the finger-pointing grooves 2 is perpendicular to the axial direction of the support body 1. The interval between the grooves 2 forms a finger block 3; the rotating cylinder 5 is fixed under the toe support part 4, and the rotating cylinder 5 is a hard semi-...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a supporting device used in the process of polishing toenail plates or coating the surfaces of the toenail plates with a fluid, and belongs to the technical field of toenail polishing tools. The supporting device comprises a cylindrical support body, wherein the support body is rotatably mounted on a bracket; the support body is composed of a toe supporting part and a rotating cylinder; the toe supporting part is located at the upper half part of the support body; five toe separating grooves, which correspond to toes of a person and have two transparent ends, are uniformly formed in the upper part of the toe supporting part; extending directions of the toe separating grooves are perpendicular to an axial direction of the support body; two inner sides of each of the toe separating grooves are made of elastic materials; spacing parts between the toe separating grooves form toe separating blocks; the rotating cylinder is fixedly connected to a position under the toe supporting part and is butt-jointed with the toe supporting part to form a complete cylinder; a rotating shaft is fixedly connected with the two ends of the rotating cylinder and mounted on the bracket through a bearing. The supporting device has the rotary support body, thereby being capable of easily adjusting angles and positions of the toes and greatly improving the operation convenience and foot comfort.

Description

technical field [0001] The invention relates to an accessory device for modifying a toenail plate or coating fluid on its surface, and belongs to the technical field of toenail plate modification tools. Background technique [0002] At present, when grooming the toenail plate or applying fluid to its surface, it is necessary to separate the five fingers and perform grooming work on each toe individually. However, people in this state for a long time will not only get tired easily, but also affect the trimming efficiency And effect, there are fixed finger splitters on the market, but this kind of finger splitter keeps the toes in one state for a long time, and it is difficult to change the position and angle. In actual operation, the toes sometimes need to move back and forth, up and down or change The angle, because it cannot be adjusted, affects the use effect. Contents of the invention [0003] In order to overcome the deficiencies of the above-mentioned prior art, the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A45D29/00A45D29/22
CPCA45D29/00A45D29/22
Inventor 刘丽丽姜德晶黄铖沈敏杰
Owner XUZHOU UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products