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Imprinting device, imprinting method, and method of manufacturing an article

A mold and substrate technology, applied in the field of imprinting devices, can solve problems such as inappropriate reference, difficulty in specifying the timing of normal/abnormal imprint processing, and the inability to accurately grasp the state of the substrate.

Active Publication Date: 2020-11-17
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the determination standard of normal / abnormality of the imprint process is constant, depending on the state of the substrate, the standard will become inappropriate, and the state of the substrate cannot be accurately grasped
That is, normality / abnormality of imprint processing cannot be accurately determined in some cases
For example, when the pattern of the mold is filled with the imprint material on the substrate, the state of the substrate changes step by step depending on the physical phenomenon (capillarity), and it is difficult to specify the timing to determine the normal / abnormality of the imprint process

Method used

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  • Imprinting device, imprinting method, and method of manufacturing an article
  • Imprinting device, imprinting method, and method of manufacturing an article
  • Imprinting device, imprinting method, and method of manufacturing an article

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Embodiment Construction

[0028] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. Note that the same reference numerals denote the same members throughout the drawings, and repeated descriptions thereof will not be given.

[0029] figure 1 is a schematic diagram showing the arrangement of the imprint apparatus 100 as an aspect of the present invention. The imprint apparatus 100 is a photolithography apparatus that forms a pattern on an imprint material on a substrate using a mold. This embodiment will describe a case where an ultraviolet curable resin cured by irradiating with ultraviolet rays is used as an imprint material. However, the imprint material can be thermoplastic or thermosetting resin.

[0030] The imprint apparatus 100 includes a substrate chuck 1 that holds a substrate W, a substrate stage 2 that supports and moves the substrate chuck 1 , a mold chuck 3 that holds a mold M on which a pattern P is formed, and a tool tha...

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Abstract

Imprinting devices, imprinting methods, and methods of making articles are disclosed. The present invention provides an imprint device that performs an imprint process of forming a pattern of imprint material on a substrate using a mold, the device including: an image sensing unit configured to sense at least one of the mold and the substrate and obtain an image, and a determination unit configured to determine normality / abnormality of the imprint process, wherein the imprint process includes a first step of supplying an imprint material onto the substrate and a second step of bringing the mold and the imprint material on the substrate into contact with each other, And the determination unit changes the reference for determining normality / abnormality of the imprint process for each step of the imprint process and determines normality / abnormality of the imprint process based on the image sensed by the image sensing unit.

Description

technical field [0001] The invention relates to a stamping device, a stamping method and a method of manufacturing an article. Background technique [0002] Imprint technology is a technology capable of forming fine patterns at the nanoscale, and is attracting attention as a mass-production nanolithography technology for semiconductor devices and magnetic storage media. An imprint apparatus using imprint technology forms a pattern on a substrate by curing a resin (imprint material) in a state where a mold on which a pattern is formed and resin on a substrate are in contact with each other, and then detaching the mold from the cured resin. [0003] In the imprint apparatus, it is effective to determine the normality / abnormality of the pattern formed on the substrate (that is, the normality / abnormality of the imprint process) based on the image sensing information from the image sensing unit arranged above the substrate (see Japanese Patent Patent Publication No.2011-3616). ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00
CPCH01L21/0274H01L21/565H01L22/12H01L22/24H01L21/67288G03F7/7035G03F7/7065G03F7/706835G03F7/70525
Inventor 相原泉太郎上野武彦
Owner CANON KK