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An immersion liquid flow field maintenance device for an immersion photolithography machine

A lithography machine and immersion technology, applied in the field of immersion liquid flow field maintenance device of immersion lithography machine, can solve problems such as negative exposure quality and influence

Active Publication Date: 2017-12-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the high-speed movement of the substrate, once the external air or sealing liquid is involved or dissolved or diffused into the filling liquid, it will have a negative impact on the exposure quality

Method used

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  • An immersion liquid flow field maintenance device for an immersion photolithography machine
  • An immersion liquid flow field maintenance device for an immersion photolithography machine
  • An immersion liquid flow field maintenance device for an immersion photolithography machine

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Embodiment Construction

[0029] Specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0030] The purpose of the present invention is to provide an immersion liquid flow field maintenance system of an immersion lithography machine. In the gap between the existing liquid supply system and the worktable, a flexible hollow structure with a certain height is added, and the bottom end of the structure is Rotating the small ball of porous adsorption material, the negative pressure from the hollow structure drives the ball to rotate and absorb and seal the immersion liquid, thus solving the problem of existing liquid supply systems due to the very close distance between the immersion head and the objective lens, the workpiece stage or the silicon wafer. The collision of the immersion head with the objective lens, the workpiece stage or the silicon wafer will affect the lithography performance and the risk of damaging the lithography equip...

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Abstract

The invention discloses an immersion liquid flow field maintenance device for an immersion photolithography machine, comprising: an immersion head and a sealing unit; the immersion head is used to provide the immersion liquid between a projection objective lens and a base; the base is located at above the substrate platform and partially submerged in the immersion liquid; the sealing unit is used to maintain the immersion liquid between the projection objective lens and the substrate when the lithography machine is in operation, characterized in that , the sealing unit is mainly composed of a liquid recovery device, a flexible pipe, and a plurality of rotating spheres, the plurality of rotating spheres absorb the immersion liquid, and dynamically maintain the filling amount of the immersion liquid in the immersion head in the exposure state.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to an immersion liquid flow field maintaining device for an immersion lithography machine. Background technique [0002] The lithography machine is one of the core equipment for the manufacture of ultra-large-scale integrated circuits. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the reticle on the silicon wafer coated with photoresist. superior. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] Immersion lithography (Immersion Lithography) equipment by filling a certain high refractive index liquid between the last projection objective lens and the silicon wafer, compared with the dry lithography machine whose intermediate...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 张崇明
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD