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Film Dryer Stand and Film Dryer

A dryer and film technology, applied in drying, drying solid materials, lighting and heating equipment, etc., can solve problems such as limited internal space, increased risk of substrate fragmentation, and difficulty in debris cleaning

Active Publication Date: 2019-03-15
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, as thin film substrates become thinner and larger in size, the risk of substrate breakage is also increasing
For the film dryer, its internal space is limited, and once the substrate is broken in the film dryer, it is extremely difficult to clean up the debris, which is time-consuming and laborious

Method used

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  • Film Dryer Stand and Film Dryer
  • Film Dryer Stand and Film Dryer
  • Film Dryer Stand and Film Dryer

Examples

Experimental program
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Embodiment Construction

[0019] see Figure 1-3 , shows a film dryer 100 provided in an embodiment of the present invention. In this embodiment, the film dryer 100 is a color filter (ColorFilter: CF) dryer for a TFT LCD display panel. It can be understood that the film dryer 100 can also be used to dry other types of films, and details will not be repeated here.

[0020] The film dryer 100 includes a cabin body 10 and a bracket 20 disposed in the cabin body 10 .

[0021] The cabin body 10 is used to provide and maintain a predetermined drying environment, such as a temperature environment, a pressure environment, and a gas environment. Specifically, the cabin body 10 may include a bottom plate 11 and a side wall (not shown in the figure), on which a hatch door and a window may be arranged. Through the hatch, the film can be taken and placed; through the window, the gas in the cabin 10 can be discharged, and / or through the window, predetermined gas can be introduced into the cabin 10 . In the illus...

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PUM

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Abstract

A support of a film drying machine comprises uprights and horizontal rods connected to the uprights, wherein the horizontal rods are used to support a to-be-dried film; the horizontal rods are in a rotatable connection with the uprights; the horizontal rods can be rotated to a preset supporting position and a cleaning position relative to the uprights; and when the horizontal rods are rotated to the cleaning position, a cleaning tool is allowed to enter and exit the space in the support of the film drying machine. The invention also relates to the film drying machine equipped with the support of the film drying machine. The film drying machine and the support of the film drying machine have the advantages that the horizontal rods are in a rotatable connection with the uprights; broad cleaning space can be formed during fragment cleaning; and thus, the fragment cleaning can be implemented conveniently and rapidly.

Description

technical field [0001] The invention relates to the field of display panel production, in particular to a film dryer bracket and a film dryer. Background technique [0002] During the manufacturing process of the display panel, the exposed and developed film needs to be dried in a dryer to cure the pattern formed on the film. However, as thin film substrates become thinner and larger in size, the risk of substrate breakage is also increasing. For the thin film dryer, its internal space is limited, and once the substrate is broken in the thin film dryer, it is very difficult to clean up the broken pieces, which is time-consuming and labor-intensive. Contents of the invention [0003] For this reason, it is necessary to provide a film dryer stand and a film dryer that are easy to clean debris. [0004] A support for a film dryer, comprising a column and a cross bar connected with the column. The cross bar is used to support the film to be dried. The crossbar is rotatably...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F26B25/00
CPCF26B25/00
Inventor 廖洪林徐海乐朱晓江
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD