Hemisphere drawing method

A hemispherical and pre-drawing technology, which is applied in the field of aerospace, can solve the problems of high processing cost, low heating time and low processing efficiency of forming speed products, and achieve the effect of low production cost, easy control of processing technology, and easy realization

Pending Publication Date: 2017-11-03
SICHUAN FUTURE AEROSPACE IND LLC
View PDF9 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] 2. Superplastic forming: This forming method is to put wool into a phase change superplastic forming device, which is composed of a slow hydraulic press, a product forming mold and an electric furnace. The heating temperature is 950°C, and the forming rate is 0.6-1.0mm / min. The characteristics of this forming method: the material thinning can be controlled at 10%, the spherical profile deviation is 1mm, and the diameter deviation is 1mm. Although this method cannot meet the requirements of profile and diameter, the two items can be compensated by controlling the material thinning. Tolerance; equipment heating time and forming speed product processing efficiency is very low, and the processing cost is very high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hemisphere drawing method
  • Hemisphere drawing method
  • Hemisphere drawing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] A hemispherical drawing method is characterized in that: comprising the following steps:

[0046] a. Cutting and blanking, cutting and blanking the plate to make blank material;

[0047] b. Pre-drawing, using the pre-drawing die to carry out the initial drawing of the blank material in a high-temperature environment, and the drawing makes the blank material into a cylinder and a semi-finished product;

[0048] c. Turning edge, the edge of the semi-finished product has a flange edge, and the flange edge of the semi-finished product is removed through turning processing to make a semi-finished product for use;

[0049] d. Hot drawing, install the smooth semi-finished product on the hot drawing die and place it in a high temperature environment for the second drawing, and draw it into a hemisphere;

[0050] e. Turning, the deep-drawn hemisphere is subjected to turning processing to remove the flange edge produced by the second drawing.

[0051]Based on the above-mentione...

Embodiment 2

[0056] A hot drawing die used in a hemispherical deep drawing method, such as figure 1 and figure 2 As shown, it includes a punch 2 and a die 3 for forming hemispherical workpieces. The punch 2 includes a pad 4 and a core 5 matching the hemisphere. The core 5 is fixed on the pad 4 by bolts. A blank holder 1 for installing the workpiece blank is also arranged between the punch 2 and the die 3, and the upper platform drives the die 3 to move up and down to realize the drawing and forming of the hemisphere.

[0057] In the process of deep drawing, the blank material is covered on the mold core, and the upper platform presses down the die to realize deep drawing, and the initial state of the blank material and the mold core is completely bonded, in order to solve this problem questions such as image 3 As shown, in another specific embodiment, the punch 2 is provided with a vent hole 51 penetrating from the top to the bottom.

[0058] Of course, in the actual processing proces...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a drawing method, in particular an aerospace hemisphere part drawing method, and belongs to the technical field of aerospace. The method comprises positioning of a hemisphere machined part in a drawing mold in pre-high-temperature environment for predrawing and hot drawing. The hemisphere drawing method solves the problems of high scrap rate, easiness in pulling fragmentation and high production cost in the prior art, and adopts twice drawing and setting in high-temperature environment to effectively prevent pulling fragmentation in the hemisphere drawing process; and the drawing method is lower in auxiliary condition requirements and easy to realize, reduces the production cost, further improves the production efficiency, guarantees the product quality, and is high in practicability.

Description

technical field [0001] The invention relates to a deep-drawing method, in particular to a deep-drawing method for aerospace hemispherical parts, belonging to the technical field of aerospace. Background technique [0002] The material of titanium alloy thick-walled hemisphere parts is TC4, the product diameter is φ406mm, and the height is 250mm. The product is finally machined to a thin-walled spherical surface of δ0.5-δ1.6mm. The product requires a wall thickness of δ8.0mm, and the wall thickness is reduced. The ratio is required to be controlled at 30%, the spherical surface requires that the deviation of the profile is not greater than 0.5mm, and the deviation of the diameter is not greater than 0.5mm. [0003] The TC4 material has excellent comprehensive properties, good thermal processing plasticity and superplasticity. The conventional processing methods for preparing titanium alloy thick-walled hemispherical blanks are hot stamping forming and superplastic forming, bu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B21D53/92B21D22/20B23P15/00
CPCB21D22/20B21D22/208B21D53/92B23P15/00
Inventor 方园凃鹏张宇
Owner SICHUAN FUTURE AEROSPACE IND LLC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products