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Polarization-independent measurement system

A technology for measuring and polarizing light, which is applied in the field of measurement systems and can solve problems such as high cost and difficulty in performing the alignment of the interferometer axis.

Active Publication Date: 2020-12-08
ASML HLDG NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Such an implementation is costly and difficult to perform the alignment of the axes of the two interferometers

Method used

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  • Polarization-independent measurement system
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Embodiment Construction

[0023] This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiments are merely illustrative of the invention. The scope of the invention is not limited to the disclosed embodiments. The invention is defined by the appended claims.

[0024] Although the described embodiments and references in this specification to "one embodiment", "an embodiment", "exemplary embodiment" etc. indicate that the described embodiments may include a particular feature, structure or characteristic, each An embodiment may not necessarily include the particular feature, structure or characteristic. Furthermore, these terms are not necessarily referring to the same embodiment. In addition, when a particular feature, structure, or characteristic is described in conjunction with an embodiment, it should be understood that implementing such feature, structure, or characteristic with respect to other embodiments is within the scope of th...

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Abstract

A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector. Additionally, an optical rotator can be configured to receive the first polarized light and rotate the polarization of the first polarized light.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to U.S. Provisional Patent Application No. 62 / 247,116, filed October 27, 2015, and is incorporated herein by reference in its entirety. technical field [0003] The present disclosure relates to metrology systems that may be used, for example, in lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a target portion of a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively called a mask or reticle, can be used to create a circuit pattern corresponding to a single layer of the IC, and this pattern can be imaged onto a layer of radiation-sensitive material (resist). layer on a target portion (eg, a portion including a die, one or more dies) on a substrate (eg, a silicon wafer). Typically, a single substrate ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
CPCG03F7/70566G03F9/7065G03F9/7088G03F9/7046G03F9/7049G03F9/7069
Inventor K·肖梅J·L·克勒泽
Owner ASML HLDG NV