Parameter Determination Method in Inclined Wavefront Interferometry Aspheric Surface

A technology of parameter determination and wavefront interference, applied in measurement devices, instruments, optical devices, etc., can solve problems such as measurement difficulties, and achieve the effect of wide application range, accurate calculation, and clear steps

Active Publication Date: 2020-09-25
WEIHAI JIARUI PHOTOELECTRIC TECH CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the measurement of aspheric surfaces is much more difficult than that of spherical surfaces
Interferometry is a common method for measuring the surface shape of optical components. In the test of a spherical surface, a higher-precision spherical surface can be processed to achieve zero position measurement. In the measurement of an aspheric surface, it must be based on the aspheric surface to be measured. Spherical equation, only by processing an aspheric surface with the same surface shape but higher precision can the zero position measurement be realized. Obviously, this method is impossible

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Parameter Determination Method in Inclined Wavefront Interferometry Aspheric Surface
  • Parameter Determination Method in Inclined Wavefront Interferometry Aspheric Surface
  • Parameter Determination Method in Inclined Wavefront Interferometry Aspheric Surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0047] It is known that the equation of the aspheric surface to be measured is An ellipse with a diameter of 190mm and a coordinate system established with the center of the circle as the origin. The pixel size of the CCD is P=7μm. This is a typical parameter. The pixel size of many industrial cameras can reach this value. The resolution The pixel size of the higher camera is a fraction of the above value; the measurement wavelength is selected as λ=632.8nm, which is the emission wavelength of a common helium-neon laser; in order to ensure a certain redundancy in the design, every 2 pixels contain One stripe, that is, n=2, the maximum allowable deviation angle |Δ calculated according to formula (11) limit |=0.0226rad. Then calculate the ellipse tangent and normal vectors according to the aspherical equation, and the angular interval is Segment the curve, and calculate the angle between the outgoing ray and the incident ray of each mirror point, the light emitted at the ori...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the field of optical precision testing and specifically relates to an aspheric surface parameter determining method in tilted-wave interferometer. The method includes steps of1, according to a given aspheric equation and diameter, dividing an aspheric surface evenly according to an angle; setting the center of incoming spherical waves and calculating mirror points of thecenter of the spherical wave relative to each node by utilizing a formula; emitting light to corresponding node coordinate positions from the mirror points so as to form a reflection wave face, judging a distribution range of measurable interference fringes according to the phase difference distribution between the calculated reflection wave face and reference spherical waves, moving the positionof the center of the spherical waves, repeating the above process until the whole aspheric surface can be measured; therefore, positions of all the spherical wave sources are determined and design ofa point source array is implemented. The method is clear in steps, accurate in calculation and wide in application range; by using a computer program, design can be made quickly; approximate evaluation is not needed during the calculation process and the calculation result is accurate.

Description

technical field [0001] The invention belongs to the field of optical precision testing, and in particular relates to a method for determining parameters in inclined wavefront interferometric measurement of aspheric surfaces. Background technique [0002] In a rotationally symmetric optical system, the use of aspheric elements can reduce the number of elements in the system while achieving higher performance. However, the measurement of an aspheric surface is much more difficult than that of a spherical surface. Interferometry is a common method for measuring the surface shape of optical components. In the test of a spherical surface, a higher-precision spherical surface can be processed to achieve zero position measurement. In the measurement of an aspheric surface, it must be based on the aspheric surface to be measured. For the spherical equation, only by processing an aspheric surface with the same surface shape but higher precision can the zero position measurement be r...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00
CPCG01B11/00
Inventor 孙文卿王军陈宝华范君柳唐云海吴泉英
Owner WEIHAI JIARUI PHOTOELECTRIC TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products