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Plasma based object characterization detection method and device

A plasma and detection method technology, which is applied in the field of material characterization and detection, can solve the problems of the detection result, such as the great influence of the probe, the high requirements of the probe, and the characterization error, so as to reduce experimental consumables, avoid probe pollution, reduce cost effect

Active Publication Date: 2018-11-13
HUAZHONG UNIV OF SCI & TECH
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Problems solved by technology

[0005] In view of the above defects or improvement needs of the prior art, the present invention provides a plasma-based object characterization detection method and device, thereby solving the problem that the atomic force microscope has extremely high requirements on the probe, and the detection result is greatly affected by the probe. The contamination of the needle tip can easily lead to technical problems in characterization errors

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  • Plasma based object characterization detection method and device
  • Plasma based object characterization detection method and device
  • Plasma based object characterization detection method and device

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Embodiment Construction

[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0024] Such as figure 1 Shown is a schematic flowchart of a plasma-based object characterization detection method provided by an embodiment of the present invention. figure 1 The methods shown include:

[0025] S1, using plasma as a probe;

[0026] S2. According to the result of the interaction between the probe and the surface of the object to be measured, the contour of the surface of the o...

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Abstract

The invention discloses a plasma based object characterization detection method and device. Physical characteristics of the surface of a to-be-detected object are represented according to interactionforce between plasma and the to-be-detected object. The plasma is taken as a probe, when approaching the surface of the object, the plasma has interaction with the surface of the object, the contour of the surface of the object can be obtained by measuring influence of the interaction between the plasma and the surface of the object, and characterization detection for the object is realized.

Description

technical field [0001] The invention belongs to the field of material characterization and detection, and more specifically relates to a method of using plasma as a probe for characterization, and detecting the surface of an object through the interaction between the plasma and the surface of the object. Background technique [0002] Ordinary electron microscopes and optical microscopes can only obtain images of microscopic objects but cannot obtain specific surface features of microscopic objects. [0003] Traditional characterization detection methods include atomic force microscope (Atomic Force Microscope, AFM) and scanning tunneling microscope (Scanning Tunneling Microscope, ATM). They all belong to a scanning probe microscopy tool. The scanning tunneling microscope is a new type of microscopic device that detects the tunneling current of electrons in the atoms on the solid surface to distinguish the topography of the solid surface according to the principle of tunnelin...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B21/20
CPCG01B21/20
Inventor 张静宇刘思垣高骥超
Owner HUAZHONG UNIV OF SCI & TECH
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